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Browsing by Hamada, SatomiAuthor

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SCIESCOPUS

A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process Go to Link

Lee, Jung-Hwan; Ryu, Heon-Yul; Hwang, Jun-Kil; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2019CitationECS Journal of Solid State Science and Technology, v.8, no.6, pp P307 - P312PublisherElectrochemical Society, Inc.

SCOPUS

Characterization of Cu-BTA organic complexes on Cu during Cu CMP and post Cu cleaning Go to Link

Cho, Byoung jun; Park, Jin-Goo; Shima, Shohei; Hamada, Satomi

ArticleIssue Date2015CitationSolid State Phenomena, v.219, pp 205 - 208PublisherScitec Publications Ltd.

SCIESCOPUS

Characterization of Different Cobalt Surfaces and Interactions with Benzotriazole for CMP Application Go to Link

Ryu, Heon-Yul; Lee, Chan-Hee; Hwang, Jun-Kil; Cho, Hwi-Won; Prasad, Nagendra Yerriboina; Kim, Tae-Gon; Hamada, Satomi; Park, Jin-Goo

ArticleIssue Date2020CitationECS Journal of Solid State Science and Technology, v.9, no.6, pp 1 - 8PublisherElectrochemical Society, Inc.

Characterization of incoming PVA brush by an ultrasonication break-in process

Lee, Jung hwan; Pyun, Hae jung; Purushothaman, Muthukrishnan; Paluvai, Nagarjuna reddy; Cho, Byoungjun; Han, Kwang min; Shima, Shohei; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

ConferenceIssue Date2017Place독일

SCIESCOPUS

Comparative evaluation of organic contamination sources from roller and pencil type PVA brushes during the Post-CMP cleaning process Go to Link

Lee, Jung-Hwan; Poddar, Maneesh Kumar; Han, Kwang-Min; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2020CitationPolymer Testing, v.90, pp 1 - 7PublisherElsevier BV

SCOPUS

Effect of dissolved oxygen on removal of benzotriazole from co during a post-co cmp cleaning Go to Link

Ryu, Heon Yul; Jalalzai, Palwasha; Yerriboina, Nagendra Prasad; Kim, Tae Gon; Hamada, Satomi; Park, Jin Goo

ArticleIssue Date2021CitationSolid State Phenomena, v.314 SSP, pp 270 - 274PublisherTrans Tech Publications Ltd

SCISCIESCOPUS

Effect of pH and chemical mechanical planarization process conditions on the copper-benzotriazole complex formation Go to Link

Cho, Byoung-Jun; Kim, Jin-Yong; Hamada, Satomi; Shima, Shohei; Park, Jin-Goo

ArticleIssue Date2016CitationJapanese Journal of Applied Physics, v.55, no.63, pp 1 - 5PublisherIOP Publishing Ltd

SCIESCOPUS

Effect of Skin Layer on Brush Loading, Cross-Contamination, and Cleaning Performance during Post-CMP Cleaning Go to Link

Sahir, Samrina; Cho, Hwi-Won; Jalalzai, Palwasha; Peter, Jerome; Singh, Randeep; Hamada, Satomi; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2022CitationECS Journal of Solid State Science and Technology, v.11, no.5, pp 1 - 8PublisherElectrochemical Society, Inc.

SCIESCOPUS

Effect of Slurry Additives on Co-BTA Complex Stability and Inhibition Property During Co CMP Process Go to Link

Jalalzai, Palwasha; Ryu, Heon-Yul; Sahir, Samrina; Meethal, Ranjith Punathil; Hamada, Satomi; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2022CitationECS Journal of Solid State Science and Technology, v.11, no.8, pp 1 - 15PublisherElectrochemical Society, Inc.

SCIESCOPUS

Effect of slurry particles on PVA brush contamination during post-CMP cleaning Go to Link

Sahir, Samrina; Cho, Hwi-Won; Jalalzai, Palwasha; Samanta, Suprakash; Hamada, Satomi; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2022CitationMaterials Science in Semiconductor Processing, v.151, pp 1 - 8PublisherPergamon Press

SCOPUS

Evaluation of competitive reaction of various cu CMP slurry components Go to Link

Han, Kwang min; Cho, Byoung jun; Lee, Jung hwan; Ryu, Heon yul; Shima, Shohei; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2017CitationICPT 2017 - International Conference on Planarization/CMP Technology, pp 230 - 235PublisherVDE Verlag GmbH

SCIESCOPUS

Investigation of Cu-BTA complex formation and removal on various Cu surface conditions Go to Link

Cho, Byoung jun; Park, Jin-Goo; Shima, Shohei; Hamada, Satomi

ArticleIssue Date2014CitationICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014, pp 70 - 74PublisherInstitute of Electrical and Electronics Engineers Inc.

SCISCIESCOPUS

Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process Go to Link

Cho, Byoung-Jun; Shima, Shohei; Hamada, Satomi; Park, Jin-Goo

ArticleIssue Date2016CitationApplied Surface Science, v.384, pp 505 - 510PublisherElsevier BV

SCOPUS

Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process Go to Link

Sahir, Samrina; Cho, Hwi-Won; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Park, Jin Goo

ArticleIssue Date2021CitationSolid State Phenomena, v.314, pp 259 - 263PublisherScitec Publications Ltd.

SCOPUS

Novel method for nano-surface analysis of Cu CMP chemicals by AFM and microfluidic chip system Go to Link

Ryu, Heon yul; Han, Kwang min; Cho, Byoung jun; Shima, Shohei; Hamada, Satomi; Hiyama, Hirokuni; Kim, Tae gon; Park, Jin goo

ArticleIssue Date2017CitationICPT 2017 - International Conference on Planarization/CMP Technology, pp 88 - 93PublisherVDE Verlag GmbH

SCIESCOPUS

Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning Go to Link

Ryu, Heon-Yul; Cho, Byoung-Jun; Yerriboina, Nagendra Prasad; Lee, Chan-Hee; Hwang, Jun-Kil; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2019CitationECS Journal of Solid State Science and Technology, v.8, no.5, pp P3058 - P3062PublisherElectrochemical Society, Inc.

SCISCIESCOPUS

Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning Go to Link

Lee, Jung-Hwan; Purushothaman, Muthukrishnan; Han, Kwang-Min; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2019CitationPolymer Testing, v.77, pp 1 - 9PublisherElsevier BV

SCIESCOPUS

Study on PVA Brush Loading and Conditioning during Shallow Trench Isolation Post-CMP Cleaning Process Go to Link

Sahir, Samrina; Cho, Hwi-Won; Kim, Tae-Gon; Hamada, Satomi; Yerriboina, Nagendra Prasad; Park, Jin-Goo

ArticleIssue Date2022CitationECS Journal of Solid State Science and Technology, v.11, no.2, pp 1 - 15PublisherElectrochemical Society, Inc.

SCIESCOPUS

The adsorption and removal of corrosion inhibitors during metal CMP Go to Link

Park, Jin-Goo; Ryu, Heon Yul; Kim, Tae Gon; Yerriboina, Nagendra.Prasad; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni

ArticleIssue Date2020CitationChina Semiconductor Technology International Conference 2020, CSTIC 2020, pp 1 - 3PublisherInstitute of Electrical and Electronics Engineers Inc.

SCIESCOPUS

Theoretical validation of inhibition mechanisms of benzotriazole with copper and cobalt for CMP and post-CMP cleaning applications Go to Link

Ryu, Heon-Yul; Lee, Chi Ho; Lee, Sang Uck; Hamada, Satomi; Yerriboina, Nagendra Prasad; Park, Jin-Goo

ArticleIssue Date2022CitationMicroelectronic Engineering, v.262, pp 1 - 8PublisherElsevier BV

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Browsing by Hamada, SatomiAuthor

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