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Browsing by Kim, Eun-JinAuthor

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22 nm node contact hole formation in extreme ultra-violet lithography Go to Link

Kim, Eun-Jin; Kim, Kwan-Hyung; Park, Hyeong-Ryeol; Yeo, Jun-Yeob; Kim, Jai-Soon; 오혜근

ArticleIssue Date2008CitationSPIEPublisherSPIE

SCIESCOPUS

Characteristics and prevention of pattern collapse in EUV lithography Go to Link

Chang, Wook; Kim, Eun-Jin; Kang, Young-Min; Park, Seung-Wook; Lim, Chang-Moon; Won, Ki-Tak; Kim, Jai-Soon; Oh, Hye-Keun

ArticleIssue Date2007CitationProceedings of SPIE - The International Society for Optical Engineering, v.6517, no.PART 2, pp 1 - 7

SCIESCOPUS

Effect of extreme-ultraviolet pellicle support to patterned mask Go to Link

Ko, Ki-ho; Kim, Eun-Jin; Kim, Ji-Won; Park, Jun-Taek; Lim, Chang-Moon; Oh, Hye-keun

ArticleIssue Date2012CitationProceedings of SPIE - The International Society for Optical Engineering, v.8322, pp 1 - 8PublisherSPIE

Evaluation of 172 nm wavelength as a possible candidate for 22 nm and below Go to Link

You, Jee-Hye; Kim, Eun-Jin; 오혜근

ArticleIssue Date2009Citation2009 SPIE Lithography AsiaPublisherSPIE

SCIESCOPUS

Heat behavior of extreme-ultraviolet pellicle including mesh support Go to Link

Kim, In-Seon; Kim, Eun-Jin; Kim, Ji-Won; Oh, Hye-Keun

ArticleIssue Date2013CitationProceedings of SPIE - The International Society for Optical Engineering, v.8679, pp 1 - 7PublisherSPIE

Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography Go to Link

Kim, Eun-Jin; You, Jee-Hye; Kim, Seong-Sue; Cho, Han-Ku; An, Ilsin; 오혜근

ArticleIssue Date2009CitationSPIE Advanced LithographyPublisherSPIE

SCIESCOPUSKCI

Influence of Defects on Top of the Absorber in Extreme Ultraviolet Lithography Go to Link

Kim, Eun-Jin; Kang, Young-Min; Oh, Hye-Keun; Park, In-Ho; Lee, Jung-Youl; Kim, Deog-Bae; Kim, Jae-Hyun

ArticleIssue Date2009CitationJournal of the Korean Physical Society, v.55, no.2, pp 463 - 466Publisher한국물리학회

SCOPUS

Influence of mask surface roughness on 22nm node extreme ultraviolet lithography Go to Link

Kim, Eun-Jin; You, Jee-Hye; Kim, Seoung-Sue; Cho, Han-Ku; Ahn, Jinho; An, Ilsin; Oh, Hye-Keun

ArticleIssue Date2010CitationProceedings of SPIE - The International Society for Optical Engineering, v.7636, pp 1 - 10PublisherSPIE

Influence of Various Defects on Extreme Ultra-Violet Mask Go to Link

Kim, Eun-Jin; You, Jee-Hye; Lee, Jung-Youl; Kim, Deog-Bae; Kim, Jae-Hyun; 오혜근

ArticleIssue Date2008CitationSPIE Lithography AsiaPublisherSPIE

SCOPUS

Is extreme-ultraviolet pellicle possible? - In terms of heat absorption Go to Link

Kim, In-Seon; Lee, Hyung-Cheol; Kim, Eun-Jin; Kim, Ji-Won; Oh, Hye-Keun

ArticleIssue Date2012CitationProceedings of SPIE - The International Society for Optical Engineering, v.8322, pp 1 - 10PublisherSPIE

SCIESCOPUS

Optimization of chromeless phase mask by comparing scattering bars with zebra patterns Go to Link

Kang, Hye-Young; Lee, Ji-Eun; Kwak, Eun-A; Kim, Eun-Jin; Park, Seung-Wook; Kim, Sung-Hyuck; Shin, Dong-Soo; Jeong, HeeJun; Oh, Hye-Keun

ArticleIssue Date2006CitationProceedings of SPIE - The International Society for Optical Engineering, v.6154, pp U1236 - U1245PublisherSPIE

SCIESCOPUS

Photoresist adhesion effect of resist reflow process Go to Link

Park, Joon-Min; Kim, Eun-Jin; Hong, Joo-Yoo; An, Ilsin; Oh, Hye-Keun

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.9A, pp 5738 - 5741PublisherIOP Publishing Ltd

SCIESCOPUS

Potent anti-inflammatory effects of two quinolinedione compounds, OQ1 and OQ21, mediated by dual inhibition of inducible NO synthase and cyclooxygenase-2 Go to Link

Lim, Kyung-Min; Lee, Joo-Young; Lee, Song-Mi; Bae, Ok-Nam; Noh, Ji-Yoon; Kim, Eun-Jin; Chung, Seung-Min; Chung, Jin-Ho

ArticleIssue Date2009CitationBritish Journal of Pharmacology, v.156, no.2, pp 328 - 337PublisherWiley-Blackwell

SCISCIESCOPUSKCI

Temperature behavior of pellicles in extreme ultraviolet lithography Go to Link

Lee, Hyung-Cheol; Kim, Eun-Jin; Kim, Ji-Won; Oh, Hye-Keun

ArticleIssue Date2012CitationJournal of the Korean Physical Society, v.61, no.7, pp 1093 - 1096Publisher한국물리학회

SCIESCOPUSKCI

광개시제 및 희석제 함량에 따른 폴리우레탄 아크릴레이트 기반 은나노 전극전사용 접착 조성물의 UV 경화특성 변화 Go to Link open access

Kim, Eun-Jin; Kim, Jung Soo; Kim, Hae Chan; Kwon, Yong Rok; Shin, Yong-Woo; Chang, Young-Wook; Kim, Dong Hyun

ArticleIssue Date2023CitationPOLYMER(KOREA), v.47, no.2, pp 135 - 142Publisher한국고분자학회

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