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Ultralow-Resistivity Molybdenum-Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-Based PrecursorGo to Link

Ha, Min-Ji; Kim, Hyunchang; Choi, Jeong-Hun; Kim, Miso; Kim, Woo-Hee; Park, Tae Joo; Shong, Bonggeun; Ahn, Ji-Hoon

ArticleIssue Date2022CitationChemistry of Materials, v.34, no.6, pp 2576 - 2584PublisherAmerican Chemical Society
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