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Browsing by Yerriboina, Nagendra PrasadAuthor

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SCIESCOPUS

A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process Go to Link

Lee, Jung-Hwan; Ryu, Heon-Yul; Hwang, Jun-Kil; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2019CitationECS Journal of Solid State Science and Technology, v.8, no.6, pp P307 - P312PublisherElectrochemical Society, Inc.

SCIESCOPUS

Acoustic power dependent detachment of PSL particles adhered to glass surfaces by dissolved gas and anionic surfactant in an ultrasonic field Go to Link

Sahoo, Bichitra Nanda; Yerriboina, Nagendra Prasad; Kang, Bong-kyun; Klipp, Andreas; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2023CitationColloids and Surfaces A: Physicochemical and Engineering Aspects, v.671, pp 1 - 16PublisherElsevier BV

SCIESCOPUS

Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant Go to Link open access

Sahoo, Bichitra Nanda; Han, So Young; Kim, Hyun-Tae; Ando, Keita; Kim, Tae-Gon; Kang, Bong-Kyun; Klipp, Andreas; Yerriboina, Nagendra Prasad; Park, Jin-Goo

ArticleIssue Date2022CitationUltrasonics Sonochemistry, v.82, pp 1 - 14PublisherElsevier BV

SCIESCOPUS

Comparative evaluation of organic contamination sources from roller and pencil type PVA brushes during the Post-CMP cleaning process Go to Link

Lee, Jung-Hwan; Poddar, Maneesh Kumar; Han, Kwang-Min; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2020CitationPolymer Testing, v.90, pp 1 - 7PublisherElsevier BV

SCIESCOPUS

Contamination Mechanism of Ceria Particles on the Oxide Surface after the CMP Process Go to Link

Han, Kwang-Min; Han, So-Young; Sahir, Samrina; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Mahadev, Niraj; Park, Jin-Goo

ArticleIssue Date2020CitationECS Journal of Solid State Science and Technology, v.9, no.12, pp 1 - 12PublisherElectrochemical Society, Inc.

SCOPUS

Effect of dissolved oxygen on removal of benzotriazole from co during a post-co cmp cleaning Go to Link

Ryu, Heon Yul; Jalalzai, Palwasha; Yerriboina, Nagendra Prasad; Kim, Tae Gon; Hamada, Satomi; Park, Jin Goo

ArticleIssue Date2021CitationSolid State Phenomena, v.314 SSP, pp 270 - 274PublisherTrans Tech Publications Ltd

SCOPUS

Effect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics Go to Link

Han, Soyoung; Yerriboina, Nagendra Prasad; Sahoo, Bichitra Nanda; Kang, Bong Kyun; Klipp, Andreas; Park, Jin Goo

ArticleIssue Date2021CitationSolid State Phenomena, v.314, pp 197 - 201PublisherScientific.net

SCIESCOPUSKCI

Fabrication of Stainless Steel Metal Mask with Electrochemical Fabrication Method and Its Improvement in Dimensional Uniformity Go to Link

Ryu, Heon-Yul; Kim, Myeong-Jun; Yerriboina, Nagendra Prasad; Srinivasan, Ramanathan; Park, Jin-Goo

ArticleIssue Date2019CitationElectronic Materials Letters, v.15, no.1, pp 7 - 17Publisher대한금속·재료학회

SCOPUS

Formulation and Evaluation of Diluted Sulfuric-Peroxide-HF (DSP+) Mixtures for Cleaning High-Aspect Ratio Contacts in 3D NAND Go to Link

An, Kook-Hyun; Kim, Dong-Gyu; Kim, Hyun-Tae; Yerriboina, Nagendra Prasad; KIM, TAE GON; Park, Jin Goo

ArticleIssue Date2021CitationSolid State Phenomena, v.314, pp 161 - 166PublisherScitec Publications Ltd.

SCIESCOPUS

Hybrid DHF and N-2 jet spray cleaning for silicon nitride and metal layer DRAM patterns Go to Link

An, Kook-Hyun; Yerriboina, Nagendra Prasad; Poddar, Maneesh Kumar; Kim, Tae-Gon; Lee, Dong-Kyu; Jung, Tae-Hoon; Lee, Jin-Ho; Lee, Hun-Hee; Park, Jin-Goo

ArticleIssue Date2020CitationMicroelectronic Engineering, v.220, pp 1 - 4PublisherElsevier BV

SCISCIESCOPUS

Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process Go to Link

Jeong, Yeon-Ah; Poddar, Maneesh Kumar; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Kim, Jaehyun; Park, Jong-Dai; Lee, Mingun; Park, Chang-Yong; Han, Seongjun, et al.

ArticleIssue Date2019CitationMicroelectronic Engineering, v.218, pp 1 - 6PublisherElsevier BV

SCIESCOPUS

Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning Go to Link

Sahir, Samrina; Yerriboina, Nagendra Prasad; Han, So-Young; Han, Kwang-Min; Kim, Tae-Gon; Mahadev, Niraj; Park, Jin-Goo

ArticleIssue Date2021CitationApplied Surface Science, v.545, pp 1 - 12PublisherElsevier BV

SCOPUS

Latest developments in the understanding of PVA brush related issues during post CMP (pCMP) cleaning Go to Link

Yerriboina, Nagendra Prasad; Park, Jin-Goo

ArticleIssue Date2021CitationAdvances in Chemical Mechanical Planarization (CMP), pp 591 - 627PublisherElsevier

SCOPUS

Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process Go to Link

Sahir, Samrina; Cho, Hwi-Won; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Park, Jin Goo

ArticleIssue Date2021CitationSolid State Phenomena, v.314, pp 259 - 263PublisherScitec Publications Ltd.

SCIESCOPUS

Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning Go to Link

Sahir, Samrina; Yerriboina, Nagendra Prasad; Han, So Young; Kim, Tae Gon; Mahadev, Niraj; Park, Jin-Goo

ArticleIssue Date2021CitationMicroelectronic Engineering, v.241, pp 1 - 11PublisherElsevier BV

SCIESCOPUS

Nanocatalyst-induced hydroxyl radical ((OH)-O-center dot) slurry for tungsten CMP for next-generation semiconductor processing Go to Link

Poddar, Maneesh Kumar; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Jeong, Yeon-Ah; Lee, Jung-Hwan; Kim, Tae-Gon; Kim, Jae-Hyun; Park, Jong-Dai; Lee, Min-Gun; Park, Chang-Yong, et al.

ArticleIssue Date2020CitationJournal of Materials Science, v.55, no.8, pp 3450 - 3461PublisherKluwer Academic Publishers

SCOPUS

Particle Removal by Surfactants During Semiconductor Cleaning Go to Link

Yerriboina, Nagendra Prasad; Park, Jin-Goo; Poddar, Maneesh Kumar

ArticleIssue Date2022CitationSurfactants in Precision Cleaning: Removal of Contaminants at the Micro and Nanoscale, pp 161 - 191PublisherElsevier

SCIESCOPUS

Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications Go to Link

Choi, In-Chan; Kim, Hyun-Tae; Yerriboina, Nagendra Prasad; Lee, Jung-Hwan; Teugels, Lieve; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2019CitationECS Journal of Solid State Science and Technology, v.8, no.5, pp P3028 - P3034PublisherElectrochemical Society, Inc.

SCOPUS

Removal of crn contamination from euv mask backside using dry cleaning Go to Link

Kim, Hyun tae; Yerriboina, Nagendra Prasad; Song, Hee jin; Park, Jin-Goo

ArticleIssue Date2018CitationSolid State Phenomena, v.282 , pp 59 - 63PublisherScitec Publications Ltd.

SCIESCOPUS

Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning Go to Link

Ryu, Heon-Yul; Cho, Byoung-Jun; Yerriboina, Nagendra Prasad; Lee, Chan-Hee; Hwang, Jun-Kil; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2019CitationECS Journal of Solid State Science and Technology, v.8, no.5, pp P3058 - P3062PublisherElectrochemical Society, Inc.

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