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Effects of fabrication conditions and post-annealing on the characteristics of thin film transistors with Zr-Al-Zn_O channel layers
- Authors
- 박진석
- Issue Date
- 1-Oct-2016
- Place
- Crete, Greece
- Conference Name
- 6th IS-TCMs
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Related Researcher
- PARK, JIN SEOK
- ERICA 공학대학 (SCHOOL OF ELECTRICAL ENGINEERING)