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Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure
- Authors
- Kim, Tae-Gon; Kim, Donggyu; Kim G.; Park, Jingoo
- Issue Date
- Jun-2022
- Publisher
- Institute of Physics
- Citation
- ECS Transactions, v.108, no.4, pp 131 - 136
- Pages
- 6
- Indexed
- SCOPUS
- Journal Title
- ECS Transactions
- Volume
- 108
- Number
- 4
- Start Page
- 131
- End Page
- 136
- ISSN
- 1938-5862
1938-6737
- Abstract
- The wetting behavior of solutions was successfully visualized in the high aspect ratio multi-stack trench pattern using the inclined-AFM methodology. The visualization allows the characterization of the wetting behavior of cleaning solutions on various hydrophobic surfaces. The experimental results agreed with the values calculated by the Wenzel & Cassie-Baxter model. The wetting characteristic analysis using inclined-AFM is an efficient method regardless of pattern dimensions. © 2022 ECS - The Electrochemical Society.
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Related Researcher
- KIM, TAE GON
- ERICA 공학대학 (MAJOR IN APPLIED MATERIAL & COMPONENTS)