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Develop Behavior of Metal Organic Chemical Vapor Deposited Sn-based Inorganic Dry Resist for Next-generation EUV Lithography
- Authors
- 김우희
- Issue Date
- 26-Jan-2024
- Conference Name
- 제 31회 한국반도체학술대회
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Related Researcher
- Kim, Woo Hee
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)