Different set processes for bipolar resistance switching in a Ta/TaOx/Pt thin film
- Authors
- Na, Sang-Chul; Chun, Min Chul; Kim, Jae-Jun; Kang, Bo Soo
- Issue Date
- Oct-2014
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- Resistance switching; TaOx; Set process
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.65, no.7, pp 1073 - 1077
- Pages
- 5
- Indexed
- SCI
SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 65
- Number
- 7
- Start Page
- 1073
- End Page
- 1077
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/21910
- DOI
- 10.3938/jkps.65.1073
- ISSN
- 0374-4884
1976-8524
- Abstract
- We observed two different set processes, gradual and avalanche, for the resistance switching (RS) of a Ta/TaO (x) /Pt thin-film device. The gradual and the avalanche set processes could be controlled by adjusting the external reset voltage. From the current-voltage curves and the effective thickness of the insulator layer, we demonstrated that the resistance states leading to gradual and avalanche set processes were dominated by interface-limited and bulk-limited conduction mechanisms, respectively. A possible model with different effective insulator thicknesses is proposed based on conducting channel formation due to oxygen vacancies.
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Collections - COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 1. Journal Articles

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