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Different set processes for bipolar resistance switching in a Ta/TaOx/Pt thin film

Authors
Na, Sang-ChulChun, Min ChulKim, Jae-JunKang, Bo Soo
Issue Date
Oct-2014
Publisher
KOREAN PHYSICAL SOC
Keywords
Resistance switching; TaOx; Set process
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.65, no.7, pp 1073 - 1077
Pages
5
Indexed
SCI
SCIE
SCOPUS
KCI
Journal Title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume
65
Number
7
Start Page
1073
End Page
1077
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/21910
DOI
10.3938/jkps.65.1073
ISSN
0374-4884
1976-8524
Abstract
We observed two different set processes, gradual and avalanche, for the resistance switching (RS) of a Ta/TaO (x) /Pt thin-film device. The gradual and the avalanche set processes could be controlled by adjusting the external reset voltage. From the current-voltage curves and the effective thickness of the insulator layer, we demonstrated that the resistance states leading to gradual and avalanche set processes were dominated by interface-limited and bulk-limited conduction mechanisms, respectively. A possible model with different effective insulator thicknesses is proposed based on conducting channel formation due to oxygen vacancies.
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