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Mechanism of the reset process in bipolar-resistance-switching Ta/TaOx/Pt capacitors based on observation of the capacitance and resistance

Authors
Na, Sang-ChulKim, Jae-JunChun, Min ChulJin, Da HeeAhn, Seung-EonKang, Bo Soo
Issue Date
Mar-2014
Publisher
AMER INST PHYSICS
Keywords
THIN-FILMS; MEMORY; IMPEDANCE SPECTROSCOPY
Citation
APPLIED PHYSICS LETTERS, v.104, no.12, pp.1 - 5
Indexed
SCIE
SCOPUS
Journal Title
APPLIED PHYSICS LETTERS
Volume
104
Number
12
Start Page
1
End Page
5
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/23344
DOI
10.1063/1.4869755
ISSN
0003-6951
Abstract
The capacitance (C) and the resistance (R) were measured at various states as the reset process progressed in bipolar-resistance-switching Ta/TaOx/Pt thin film capacitors. The reset process was found to undergo three sequential stages where C and R showed different behavior: increasing C and constant R before an abrupt reset transition, the rapid increase of both C and R upon transition, and saturated C thereafter. These behaviors can be explained in terms of the annihilation of the oxygen vacancies followed by rupture of the conducting channels. (C) 2014 AIP Publishing LLC.
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