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Resistive Switching and Transport Characteristics of Cu/a-Si/Si Devices

Authors
Kang, Bo SooCha, DongjaeLee, SungjooNa, Sang-ChulKim, Dong-Wook
Issue Date
May-2011
Publisher
KOREAN PHYSICAL SOC
Keywords
Resistive switching; a-Si; Metal-semiconductor-semiconductor structure
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.58, no.5, pp.1156 - 1159
Indexed
SCIE
SCOPUS
KCI
Journal Title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume
58
Number
5
Start Page
1156
End Page
1159
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/38117
DOI
10.3938/jkps.58.1156
ISSN
0374-4884
Abstract
We prepared Cu/amorphous silicon (a-Si)/Si structures with active device diameters of 5, 10, and 20 mu m. The Cu/a-Si/Si devices showed bipolar resistive switching (RS) behaviors and the ON/OFF ratio was larger than 10(6). In the low-resistance state (LRS), the current-voltage (I-V) curves of the 10- and 20-mu m-sized devices were linear. In contrast, the LRS I-V curves for the 5-mu m-sized devices were symmetric and nonlinear, which could be explained by tunnelling conduction. The Cu/a-Si/Si devices consist of materials compatible with conventional CMOS processes and can be candidates for nonvolatile memory devices.
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