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Effects of carbon on improved resistivity of low temperature chemical vapor deposited HfCN films
- Authors
- Jang,Jae Hyuck; Park,Tae Joo; Kim,Jeong Hwan; Na,Duk L; Park,Woo Young; Kim,Miyoung; Hwang,Cheol Seong
- Issue Date
- Jan-2009
- Publisher
- Electrochemical Society, Inc.
- Citation
- Journal of the Electrochemical Society, v.156, pp 0 - 0
- Pages
- 1
- Indexed
- SCOPUS
KCI
- Journal Title
- Journal of the Electrochemical Society
- Volume
- 156
- Start Page
- 0
- End Page
- 0
- ISSN
- 0013-4651
1945-7111
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Related Researcher
- Park, Tae Joo
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)