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SAM modification of CMP conditioner for the prevention of particle adhesion

Authors
Kwon, Tae YoungKang, Young-JaeKim, In-KwonKim, Dong ChanKim, JeongChun, Jong sunPark, Mun seakPark, Jin-Goo
Issue Date
2009
Publisher
Electrochemical Society, Inc.
Citation
ECS Transactions, v.25, no.5, pp.95 - 99
Indexed
SCIE
SCOPUS
Journal Title
ECS Transactions
Volume
25
Number
5
Start Page
95
End Page
99
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/41802
DOI
10.1149/1.3202640
ISSN
1938-5862
Abstract
Pad conditioning is a necessary step during CMP (Chemical Mechanical Planarization) process to maintain the performance such as uniform material removal rate and its uniformity. The Ni electroplated diamond conditioner has been used and its surface could be easily contaminated by slurry particles and by-products during conditioning. We have proposed the hydrophobic SAM (self assembled monolayer) modification to CMP conditioner to reduce residue contamination. After CMP conditioning process, the contamination was reduced highly on the surface of the conditioner when it was coated with hydrophobic film.
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Park, Jin Goo
ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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