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High-current-density CuOx/ZnOx thin-film diodes for cross-point memory applications

Authors
Kang, Bo SooAhn, Seung-EonLee, Myoung-JaeStefanovich, GenrikhKim, Ki HwanXianyu, Wen XuLee, Chang BumPark, YoungsooBaek, In GyuPark, Bae Ho
Issue Date
Aug-2008
Publisher
WILEY-V C H VERLAG GMBH
Keywords
CURRENT-VOLTAGE CHARACTERISTICS; LOW-TEMPERATURE; OXIDE-FILMS; TRANSPARENT; RESISTANCE; FABRICATION
Citation
ADVANCED MATERIALS, v.20, no.16, pp.3066 - 3069
Indexed
SCIE
SCOPUS
Journal Title
ADVANCED MATERIALS
Volume
20
Number
16
Start Page
3066
End Page
3069
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/42235
DOI
10.1002/adma.200702932
ISSN
0935-9648
Abstract
Room-temperature-deposited CuOx/InZnOx thin-film heteroJunction diodes show a high current density of 3.5 X 10(4) A cm(-2) and a high on/off current ratio of 10(6) (see figure). The oxide diode is a promising switch element for three-dimensional stackable memory devices, where high-temperature-prepared silicon diodes are difficult to apply.
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