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Two series oxide resistors applicable to high speed and high density nonvolatile memory

Authors
Lee, Myoung-JaePark, YoungsooSuh, Dong-SeokLee, Eun-HongSeo, SunaeKim, Dong-ChirlJung, RanjuKang, Bo-SooAhn, Seung-EonLee, Chang BumSeo, David H.Cha, Young-KwanYoo, In-KyeongKim, Jin-SooPark, Bae Ho
Issue Date
Nov-2007
Publisher
WILEY-V C H VERLAG GMBH
Keywords
METAL-INSULATOR-TRANSITION; THIN-FILMS; NIO FILMS
Citation
ADVANCED MATERIALS, v.19, no.22, pp.3919 - 3923
Indexed
SCIE
SCOPUS
Journal Title
ADVANCED MATERIALS
Volume
19
Number
22
Start Page
3919
End Page
3923
URI
https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/43218
DOI
10.1002/adma.200700251
ISSN
0935-9648
Abstract
A memory cell consisting of a Pt/VO2/ Pt switch element and a Pt/NiO/Pt memory element connected in series. By applying a voltage higher than V-th of 0.6 V, the switch element reaches the on state and the cell can be accessed. Since reset and set voltages are higher than V-th, information can be written by simply applying an appropriate voltage to a selected cell. By applying a voltage lower than V-th to the other cells, we can keep the other cells in the off state and prevent interference between the selected cell and the others.
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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 1. Journal Articles

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