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Area-selective atomic layer deposition using inkjet-printed fluorocarbon patterns as mask layers
- Issue Date
- May-2018
- Publisher
- Blackwell Publishing Ltd
- Keywords
- Area-selective Atomic Layer Deposition (AS-ALD); Fluorocarbon; Inkjet Printing; Mask Pattern
- Citation
- Digest of Technical Papers - SID International Symposium, v.49, no.1, pp.1478 - 1481
- Indexed
- SCOPUS
- Volume
- 49
- Number
- 1
- Start Page
- 1478
- End Page
- 1481
- ISSN
- 0097-966X
- Abstract
- This study introduces area‐selective atomic layer deposition (AS‐ALD) using fluorocarbon (FC) mask patterns with low surface energy. FC mask patterns were formed on a glass substrate by inkjet printing method. The surface energy of the printed FC thin film was 13.04 dyne/cm enough low to inhibit nucleation and growth during ALD. 10 µm wide Al2O3 patterns were selectively formed by removal of FC mask patterns using oxygen plasma after Al2O3 ALD processes. © 2018, Blackwell Publishing Ltd. All rights reserved.
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Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)