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Exceptionally linear and highly sensitive photo-induced unipolar inverter device

Authors
Naqi, M.Lee, Ji YeLee, Byeong HyeonKim, SunkookLee, Sang YeolYoo, Hocheon
Issue Date
Jan-2021
Publisher
Institute of Electrical and Electronics Engineers Inc.
Keywords
amorphous silicon indium zinc oxide (a-SIZO); Electrodes; Field effect transistors; field-effect transistor (FET); Inverters; Logic gates; Optical variables measurement; photo-induced inverter.; phototransistor; Phototransistors; Semiconductor device measurement; Unipolar inverter
Citation
IEEE Journal of the Electron Devices Society, v.9, pp.180 - 186
Journal Title
IEEE Journal of the Electron Devices Society
Volume
9
Start Page
180
End Page
186
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/80469
DOI
10.1109/JEDS.2020.3048725
ISSN
2168-6734
Abstract
Oxide semiconductors are of particular interest in the field of integrated electronics due to their large-area fabrication, high uniformity, and superior performance. Here, we report an exceptionally sensitive photo-induced inverter device with high linearity based on the unipolar n-type channel material amorphous silicon indium zinc oxide (a-SIZO). The field-effect transistor (FET) based on a-SIZO exhibits maximum mobility of 9.8 cm2/Vs at VD of 5 V, high on/off ratio of 106, and stable threshold voltage (VTh) of -0.35 V. Additionally, the optical properties of the proposed FET include excellent VTh shift and photocurrent (Iphoto) with high linearity under various red-light illumination. The proposed enhancement-load type inverter device shows reliable electrical and optical characteristics with an inverter gain of 0.7 at VDD of 1 V and linear photo-response in terms of inverter gain and voltage shift, demonstrating promising potential in the field of integrated electronics for optoelectronic applications. CCBY
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Lee, Sang Yeol
반도체대학 (반도체·전자공학부)
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