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6.7nm 리소그래피용 브래그 반사형 거울과 흡수체 물질 연구 Go to Link

Jeong, Seonghoon; Hong, Seongchul; Kim, Jung Sik; Ahn, Jinho

ArticleIssue Date2016Citation대한금속·재료학회지, v.54, no.5, pp 379 - 385Publisher대한금속·재료학회

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Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy Go to Link

Lee, Jae Uk; Hong, Seongchul; Ahn, Jinho; Doh, Jonggul; Jeong, SeeJun

ArticleIssue Date2014CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.32, no.3, pp 1 - 6PublisherAmerican Institute of Physics

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Attenuated phase-shift mask for mitigation of photon shot noise effect in contact hole pattern for extreme ultraviolet lithography Go to Link

Kim, Jung Sik; Hong, Seongchul; Lee, Jae Uk; Lee, Seung Min; Ahn, Jinho

ArticleIssue Date2014CitationApplied Physics Express, v.7, no.9, pp 1 - 5PublisherIOP Publishing Ltd

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Effect of extreme ultraviolet photoresist underlayer optical properties on imaging performance Go to Link

Kim, Jung Sik; Cho, Han Ku; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2015CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.33, no.6, pp 1 - 5PublisherAmerican Institute of Physics

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Effect of Side Lobe Intensity and Photon Shot Noise Effect on the Missing Hole Phenomenon in Extreme Ultraviolet Lithography Go to Link

Kim, Jung Sik; Hong, Seongchul; Jang, Yong Ju; Ahn, Jinho

ArticleIssue Date2017Citation대한금속·재료학회지, v.55, no.2, pp 139 - 143Publisher대한금속·재료학회

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Effect on Critical Dimension Performance for Carbon Contamination of Extreme Ultraviolet Mask Using Coherent Scattering Microscopy and In-situ Contamination System Go to Link

Doh, Jonggul; Lee, Sangsul; Lee, Jaewook; Hong, Seongchul; Jeong, Chang Young; Lee, Dong Gun; Kim, Seong-Sue; Ahn, Jinho

ArticleIssue Date2012CitationJapanese Journal of Applied Physics, v.51, no.6, pp 1 - 6PublisherIOP Publishing Ltd

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Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography Go to Link

Hong, Seongchul; Kim, Jung Sik; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Ahn, Jinho

ArticleIssue Date2015CitationJournal of Nanoscience and Nanotechnology, v.15, no.11, pp 8652 - 8655PublisherAmerican Scientific Publishers

SCOPUS

Evaluation of optical properties of EUV resist underlayer Go to Link

Kim, Jung Sik; Hong, Seongchul; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Song, Hyun Min; Ahn, Jin ho

ArticleIssue Date2015CitationProceedings of SPIE - The International Society for Optical Engineering, v.9422PublisherSPIE

SCIESCOPUS

Impact of EUV Pellicle Transmittance on Imaging Performance Analyzed by Coherent Scattering Microscopy Go to Link

Woo, Dong Gon; Hong, Seongchul; Cho, Han Ku; Ahn, Jinho

ArticleIssue Date2016CitationNanoscience and Nanotechnology Letters, v.8, no.7, pp 615 - 619PublisherAmerican Scientific Publishers

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Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography Go to Link

Lee, Sangsul; Lee, Inhwan; Doh, Jong Gul; Lee, Jae Uk; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2013CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.31, no.2, pp 1 - 6PublisherAmerican Institute of Physics

SCIESCOPUS

Improved Margin of Absorber Pattern Sidewall Angle Using Phase Shifting Extreme Ultraviolet Mask Go to Link

Jang, Yong Ju; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2016CitationNanoscience and Nanotechnology Letters, v.8, no.7, pp 544 - 548PublisherAmerican Scientific Publishers

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Nickel and Nickel Oxide Thin Films as Absorber Layer Materials of Extreme Ultraviolet Masks Go to Link

Woo, Dong Gon; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2017CitationNanoscience and Nanotechnology Letters, v.9, no.1, pp 20 - 23PublisherAmerican Scientific Publishers

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Phase Shift Mask to Compensate for Mask 3D Effect in High-Numerical-Aperture Extreme Ultraviolet Lithography Go to Link

Jang, Yong Ju; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2016CitationNanoscience and Nanotechnology Letters, v.8, no.9, pp 729 - 733PublisherAmerican Scientific Publishers

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Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography Go to Link

Hong, Seongchul; Jeong, Seejun; Lee, Jae Uk; Lee, Seung Min; Ahn, Jinho

ArticleIssue Date2013CitationApplied Physics Express, v.6, no.9, pp 1 - 5PublisherIOP Publishing Ltd

SCOPUS

Stochastic resist patterning simulation using attenuated PSM for EUV Lithography Go to Link

Hong, Seongchul; Jeong, Seejun; Lee, Jae Uk; Lee, Seung Min; Kim, Jongseok; Doh, Jonggul; Ahn, Jin ho

ArticleIssue Date2013CitationProceedings of SPIE - The International Society for Optical Engineering, v.8679PublisherSPIE

SCIESCOPUS

Sub-Resolution Assist Feature in Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography Go to Link

Kim, Jung Sik; Hong, Seongchul; Jang, Yong Ju; Ahn, Jinho

ArticleIssue Date2016CitationNanoscience and Nanotechnology Letters, v.8, no.9, pp 739 - 743PublisherAmerican Scientific Publishers

SCISCIESCOPUS

Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning Go to Link

Lee, Jae Uk; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2013CitationApplied Physics Express, v.6, no.7, pp 1 - 4PublisherIOP Publishing Ltd

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고 개구수 극자외선 노광 기술용 위상 변위 흡수체 구조의 설계 Go to Link

Jang, Yong Ju; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2016Citation대한금속·재료학회지, v.54, no.6, pp 455 - 460Publisher대한금속·재료학회

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그림자 효과 완화 및 내화학성 향상을 위한 탄탈륨-니켈 화합물 극자외선 흡수체

Woo, Dong Gon; Hong, Seongchul; Kim, Jung Sik; Yang, Chul Kyu; Lee, Jong Hwa; Shin, Chul; Ahn, Jinho

ArticleIssue Date2016Citation대한금속·재료학회지, v.54, no.7, pp 546 - 551Publisher대한금속·재료학회

SCIESCOPUSKCI

새로운 EUV 흡수체 연구：니켈 & 니켈 산화물 Go to Link

Woo, Dong Gon; Kim, Jung Hwan; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2017Citation대한금속·재료학회지, v.55, no.3, pp 198 - 201Publisher대한금속·재료학회

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Browsing by Hong, SeongchulAuthor

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