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EUV reflectometry and scatterometry for thin layer and periodic structure characterization Go to Link

Shen, Tao; Mochi, Iacopo; Ansuinelli, Paolo; Jeong, Dongmin; Ahn, Jinho; Ekinci, Yasin

ArticleIssue Date2024CitationMETROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII, v.12955, pp 1 - 9PublisherSPIE-INT SOC OPTICAL ENGINEERING

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Improving etchability and imaging performance of EUV mask absorber materials via ion implantation Go to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Bom-Sok; Kim, Myung-Jin; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2026CitationApplied Physics A: Materials Science and Processing, v.132, no.4, pp 1 - 8PublisherSpringer Science and Business Media Deutschland GmbH

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Improving etchability and imaging performance of EUV mask absorber materials via ion implantation (Vol 132, 245, 2026)Go to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Bom-Sok; Kim, Myung-Jin; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2026CitationAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.132, no.5, pp 1 - 1PublisherSPRINGER HEIDELBERG

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Improving Etchability of Challenging Materials through the Ion Implantation Process

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Myung-Jin; Kim, Bom-Sok; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13215, pp 1 - 6PublisherSPIE

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Platinum-based alloy absorber with improved etching properties for next-generation EUV mask Go to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Ahn, Jinho

ArticleIssue Date2023CitationProceedings of SPIE - The International Society for Optical Engineering, v.12750, pp 1 - 6PublisherSPIE

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Pt-W alloy absorbers for high-NA EUV lithography: tunable optical and etching performance Go to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2025CitationNanotechnology, v.36, no.35, pp 1 - 7PublisherInstitute of Physics Publishing

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Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank Go to Link

Shen, Tao; Mochi, Iacopo; Jeong, Dongmin; Mueller, Elisabeth; Ansuinelli, Paolo; Ahn, Jinho; Ekinci, Yasin

ArticleIssue Date2024CitationJournal of Micro/ Nanolithography, MEMS, and MOEMS, v.23, no.4, pp 1 - 12PublisherSPIE - International Society for Optical Engineering

SCIESCOPUS

Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024)Go to Link

Shen, Tao; Mochi, Iacopo; Jeong, Dongmin; Mueller, Elisabeth; Ansuinelli, Paolo; Ahn, Jinho; Ekinci, Yasin

ArticleIssue Date2024CitationJournal of Micro/ Nanolithography, MEMS, and MOEMS, v.23, no.4, pp 1 - 2PublisherSPIE - International Society for Optical Engineering

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Browsing by Jeong, DongminAuthor

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