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Showing results 1 to 19 of 19

SCIESCOPUS
Characteristics of cobalt films deposited by metal organic chemical vapor deposition method using dicobalt hexacarbonyl tert-butylacetyleneGo to Link

Lee, Keunwoo; Park, Taeyong; Lee, Jaesang; Kim, Jinwoo; Kim, Jeongtae; Kwak, Nohjung; Yeom, Seungjin; Jeon, Hyeongtag

ArticleIssue Date2008CitationJapanese Journal of Applied Physics, v.47, no.7, pp 5396 - 5399PublisherIOP Publishing Ltd
SCISCIESCOPUSKCI
Characterization of the Co film deposited by MOCVD using dicobalt (Hexacarbonyl) tert-butylacetylene and the CoSi2 film formed by a two-step annealing process with a Ti capping layerGo to Link

Lee, Jaesang; Kim, Hyungchul; Park, Taeyong; Jeon, Heeyoung; Park, Jingyu; Jeon, Hyeongtag

ArticleIssue Date2012CitationJournal of Ceramic Processing Research, v.13, no.5, pp 595 - 600Publisher세라믹공정연구센터
SCISCIESCOPUS
Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applicationsGo to Link

Lee, Jaesang; Kim, Hyungchul; Park, Taeyong; Ko, Youngbin; Ryu, Jaehun; Jeon, Heeyoung; Park, Jingyu; Jeon, Hyeongtag

ArticleIssue Date2012CitationJournal of Vacuum Science and Technology A, v.30, no.1, pp 1 - 7PublisherAmerican Institute of Physics
SCISCIESCOPUS
Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition

Lee, Jaesang; Lee, Seung Jae; Han, Won Bae; Jeon, Heeyoung; Park, Jingyu; Jang, Woochool; Yoon, Chong Seung; Jeon, Hyeongtag

ArticleIssue Date2013Citationphysica status solidi (a) - applications and materials science, v.210, no.2, pp 276 - 284PublisherWiley - V C H Verlag GmbbH & Co.
SCOPUS
Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film

Lee, Jaesang; Lee, Seung Jae; Han, Won Bae; Jeon, Heeyoung; Park, Jingyu; Kim, Hyunjung; Yoon, Chong Seung; Jeon, Hyeongtag

ArticleIssue Date2012CitationECS Journal of Solid State Science and Technology, v.1, no.4, pp Q63 - Q69PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin FilmsGo to Link

Kim, Hyungchul; Woo, Sanghyun; Lee, Jaesang; Kim, Yongchan; Lee, Hyerin; Choi, Ik-Jin; Kim, Young-Do; Chung, Chin-Wook; Jeon, Hyeongtag

ArticleIssue Date2011CitationJournal of the Electrochemical Society, v.158, no.1, pp H21 - H24PublisherElectrochemical Society, Inc.
SCISCIESCOPUSKCI
Effects of a SiO2 buffer layer on the flatband voltage shift of La2O3 gate dielectric grown by using remote plasma atomic layer depositionGo to Link

Lee, Hyerin; Kim, Hyungchul; Lee, Jaesang; Jeon, Hyeongtag

ArticleIssue Date2012CitationJournal of the Korean Physical Society, v.61, no.7, pp 1051 - 1055Publisher한국물리학회
SCISCIESCOPUS
Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer depositionGo to Link

Kim, Yongchan; Woo, Sanghyun; Kim, Hyungchul; Lee, Jaesang; Kim, Honggyu; Lee, Hyerin; Jeona, Hyeongtag

ArticleIssue Date2010CitationJournal of Materials Research, v.25, no.10, pp 1898 - 1903PublisherMaterials Research Society
SCISCIESCOPUS
Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer depositionGo to Link

Park, Taeyong; Lee, Jaesang; Park, Jingyu; Jeon, Heeyoung; Jeon, Hyeongtag; Lee, Ki-Hoon; Cho, Byung-Chul; Kim, Moo-Sung; Ahn, Heui-Bok

ArticleIssue Date2012CitationJournal of Vacuum Science and Technology A, v.30, no.1, pp 1 - 6PublisherAmerican Institute of Physics
SCISCIESCOPUS
Electrical stability enhancement of the amorphous In-Ga-Zn-O thin film transistor by formation of Au nanoparticles on the back-channel surfaceGo to Link

Cho, Byungsu; Lee, Jaesang; Seo, Hyungtak; Jeon, Hyeongtag

ArticleIssue Date2013CitationApplied Physics Letters, v.102, no.10, pp 1 - 5PublisherAmerican Institute of Physics
SCIESCOPUS
Epitaxial CoSi2 formation using an oxynitride buffer layerGo to Link

Lee, Jaesang; Lee, Keunwoo; Kim, Dongock; Park, Taeyong; Kim, Honggyu; Jeon, Hyeongtag

ArticleIssue Date2009CitationJournal of Materials Research, v.24, no.8, pp 2705 - 2710PublisherMaterials Research Society
SCISCIESCOPUS
Formation of a crystalline nanotube-nanoparticle hybrid by post water-treatment of a thin amorphous TiO2 layer on a TiO2 nanotube array as an efficient photoanode in dye-sensitized solar cellsGo to Link

Kurian, Sajith; Sudhagar, P.; Lee, Jaesang; Song, Donghoon; Cho, Woohyung; Lee, Sanghun; Kang, Yong Soo; Jeon, Hyeongtag

ArticleIssue Date2013CitationJournal of Materials Chemistry A, v.1, no.13, pp 4370 - 4375PublisherRoyal Society of Chemistry
SCIESCOPUS
Formation of an Epitaxial CoSi2 Layer with Reduced Oxygen ContaminationGo to Link

Lee, Jaesang; Lee, Keunwoo; Park, Taeyong; Kim, Dongock; Jeon, Hyeongtag

ArticleIssue Date2009CitationJournal of the Electrochemical Society, v.156, no.5, pp H352 - H355PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
Investigation of the Flatband Voltage (V-FB) Shift of Al2O3 on N-2 Plasma Treated Si SubstrateGo to Link

Kim, Hyungchul; Lee, Jaesang; Jeon, Heeyoung; Park, Jingyu; Jeon, Hyeongtag

ArticleIssue Date2013CitationJournal of Nanoscience and Nanotechnology, v.13, no.9, pp 6275 - 6279PublisherAmerican Scientific Publishers
SCOPUS
Low resistive and uniform CoSi 2 formation with Ti capping layerGo to Link

Lee, Jaesang; Kim, Hyungchul; Woo, Sanghyun; Lee, Hyerin; Jeon, Hyeong tag

ArticleIssue Date2011CitationAIP Conference Proceedings, v.1399, pp 187 - 188PublisherAmerican Institute of Physics
SCISCIESCOPUS
Reduction of RuO2 Film to Metallic Ru Film Using Atomic Layer Deposition under Different Oxygen Partial PressureGo to Link

Park, Taeyong; Lee, Jaesang; Park, Jingyu; Jeon, Heeyoung; Jeon, Hyeongtag

ArticleIssue Date2013CitationJapanese Journal of Applied Physics, v.52, no.5, pp 1 - 5PublisherIOP Publishing Ltd
SCISCIESCOPUS
The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALDGo to Link

Kim, Hyungchul; Woo, Sanghyun; Lee, Jaesang; Kim, Honggyu; Kim, Yongchan; Lee, Hyerin; Jeon, Hyeongtag

ArticleIssue Date2010CitationJournal of the Electrochemical Society, v.157, no.4, pp H479 - H482PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer DepositionGo to Link

Lee, Jaesang; Kim, Hyungchul; Park, Taeyong; Ko, Youngbin; Jeon, Heeyoung; Park, Jingyu; Ryu, Jaehun; Jeon, Hyeongtag

ArticleIssue Date2012CitationJournal of Nanoscience and Nanotechnology, v.12, no.7, pp 5494 - 5499PublisherAmerican Scientific Publishers
SCISCIESCOPUS
The effects of RF power on the interfacial property between Al2O3 and Si3N4 and on the memory property in a MANOS structureGo to Link

Kim, Hyungchul; Woo, Sanghyun; Lee, Jaesang; Lee, Hyerin; Jeon, Hyeongtag

ArticleIssue Date2010CitationJournal of Physics D: Applied Physics, v.43, no.50, pp 1 - 6PublisherIOP Publishing Ltd.
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