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Enhanced electrical characteristics of Au nanoparticles embedded in high-k HfO2 matrix
- Issue Date
- Sep-2006
- Publisher
- AMER INST PHYSICS
- Citation
- JOURNAL OF APPLIED PHYSICS, v.100, no.6
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF APPLIED PHYSICS
- Volume
- 100
- Number
- 6
- ISSN
- 0021-8979
- Abstract
- We present experimental results for laser-induced Au nanoparticle (NP) embedded in a HfO2 high-k dielectric matrix. Cross-sectional transmission electron microscopy images showed that the Au NPs of 8 nm in diameter were clearly embedded in HfO2 matrix. Capacitance-voltage measurements of Pt/HfO2/Au NPs/HfO2 on p-type Si substrate reliably exhibited metal-oxide-semiconductor behavior with a large flatband shift of 4.7 V. In addition, the charge retention time at room temperature was found to exceed 10(5) h. This longer time was attributed to the higher electron barrier height via high work function of the Au NP.
- Appears in
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Related Researcher
- Hong, Jin Pyo
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)