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First demonstration of federated learning with homomorphic encryption using vertically-stacked ferroelectric tunnel junction

Authors
Kim, Jeong-HanIm, JiseongSong, MinsukYoo, YelinLee, JongwooKoo, Ryun-HanKim, JangsaengKwon, Daewoong
Issue Date
Jan-2026
Publisher
IEEE
Citation
2025 IEEE International Electron Devices Meeting (IEDM), pp 1 - 4
Pages
4
Indexed
SCOPUS
Journal Title
2025 IEEE International Electron Devices Meeting (IEDM)
Start Page
1
End Page
4
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213063
DOI
10.1109/IEDM50572.2025.11353691
ISSN
0163-1918
2156-017X
Abstract
A novel vertical ferroelectric tunnel junction (VFTJ) array enabling hardware-level implementation of homomorphic encryption (HE) for secure federated learning (FL) is proposed. A highly integrated 4-stack TiN/SiO2 structure with vertically etched hole-type architecture was fabricated. Distinct ferroelectric and ionic switching induced by interfacial TiOx formation significantly enhanced tunneling electroresistance (TER) and switching reliability. The intrinsic randomness of devices enabled the realization of polynomial samplers (ternary, Gaussian, uniform) essential for HE schemes. The proposed VFTJ-based FL achieves accuracy comparable to the software baseline, exhibiting less than 4% accuracy reduction under highly non-IID conditions
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