CAU Scholar

Current filters:
Current filters:
Current filters:
Current filters:
Add filters:

Results 1-5 of 5 (Search time: 0.842 seconds).

Influence of Oxygen Additions on the Etch Characteristics of TaN Thin Films in CF4/Ar Plasma

Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12890 - 12893PublisherAMER SCIENTIFIC PUBLISHERS
Etching Characteristics of Titanium Nitride in Chlorine-Based Plasma

Wang, Yi-Yu; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12933 - 12935PublisherAMER SCIENTIFIC PUBLISHERS
Effect of CF4 Addition to Cl-2/Ar Plasma on the Etching of ZrO2 Thin Films

Son, Seok; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12886 - 12889PublisherAMER SCIENTIFIC PUBLISHERS
Etching Characteristics of TaNO Thin Film for Top Electrode Materials Using Inductivity Coupled CF4/Ar Plasma

Woo, Jong-Chang; Joo, Young-Hee; Kang, Pil-Seung; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12882 - 12885PublisherAMER SCIENTIFIC PUBLISHERS
Furnace O-2 Annealing Growth of Cu2O Thin Film for Thin-Film Transistors at Low Temperature

Woo, Jong-Chang; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12878 - 12881PublisherAMER SCIENTIFIC PUBLISHERS
1

Discover

Date Issued

Type

STATISTICS
Total View :7,097,006
Today View :2,785

RSS_1.0 RSS_2.0 ATOM_1.0

CONTACT US

84, Heukseok-ro, Dongjak-gu, Seoul, Republic of Korea (06974)02-820-6194

COPYRIGHT 2019 Chung-Ang University All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

BROWSE

한국어