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A novel approach for PVA brush evaluation by contact area analysis during metal and oxide post-CMP cleaning

김태곤

ConferenceIssue Date2023PlaceKanazawa, Japan

A Novel Method to Evaluate the Contact Area of PVA Brushes during Post-CMP Cleaning

김태곤

ConferenceIssue Date2023PlaceBusan, Korea

SCIESCOPUS

Acoustic power dependent detachment of PSL particles adhered to glass surfaces by dissolved gas and anionic surfactant in an ultrasonic field Go to Link

Sahoo, Bichitra Nanda; Yerriboina, Nagendra Prasad; Kang, Bong-kyun; Klipp, Andreas; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2023CitationColloids and Surfaces A: Physicochemical and Engineering Aspects, v.671, pp 1 - 16PublisherElsevier BV

An Analysis Method of the Wetting Characteristic of High Aspect Ratio Structure

김태곤

ConferenceIssue Date2021

SCOPUS

Atomic resolution quality control for Fin oxide recess by atomic resolution profiler Go to Link

Kim, Tae-Gon; Ryu, Heon-Yul; Kenis, Karine; Jo, Ah-Jin; Cho, Sang-Joon; Park, Sang-Il; Schmidt, Sebastian; Irmer, Bernd

ArticleIssue Date2016CitationSolid State Phenomena, v.255, pp.304 - 308PublisherTrans Tech Publications Ltd

Automated In-line AFM for Surface Profiling in CMP Applications

김태곤

ConferenceIssue Date2019PlaceHsinchu, Taiwan

SCIESCOPUS

Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application Go to Link

Punathil Meethal, Ranjith; Jalalzai, Palwasha; Muskan; Kumar, Sumit; Peter, Jerome; Klipp, Andreas; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2023CitationJournal of Colloid and Interface Science, v.643, pp 465 - 479PublisherAcademic Press

SCIESCOPUS

Boosting performance of CdTe photocathode with pulse-reverse electrodeposited nickel telluride-nickel phosphide dual co-catalysts Go to Link

Jo, Woohyeon; Han, Seungyeon; Jeong, Jaebum; Kim, Taegeon; Son, Min-Kyu; Yoon, Seog-Young; Jung, Hyunsung

ArticleIssue Date2023CitationInternational Journal of Hydrogen Energy, v.48, no.16, pp 6253 - 6261PublisherPergamon Press Ltd.

Changes in Surface Chemical Characteristics of 4H-SiC for Better Cleaning Performance

김태곤

ConferenceIssue Date2024PlaceWild Horse Pass Resort Chandler AZ

SCOPUS

Characteristics of high power laser shock waves and their cleaning performance Go to Link

Kim, Tae Gon; Yoo, Young Sam; Son, Il Ryong; Jang, Deoksuk; Kim, Dongsik; Lee, Jong Myung; Choi, Jae Sung; Busnaina, Ahmed .A.; Park, Jin-Goo

ArticleIssue Date2007CitationECS Transactions, v.11, no.2, pp 41 - 46PublisherElectrochemical Society, Inc.

Characterization of Alkaline Cu/Ti Slurry for TSV Chemical Mechanical Planarization

김태곤

ConferenceIssue Date2023PlaceBusan, Korea

SCIESCOPUS

Characterization of Different Cobalt Surfaces and Interactions with Benzotriazole for CMP Application Go to Link

Ryu, Heon-Yul; Lee, Chan-Hee; Hwang, Jun-Kil; Cho, Hwi-Won; Prasad, Nagendra Yerriboina; Kim, Tae-Gon; Hamada, Satomi; Park, Jin-Goo

ArticleIssue Date2020CitationECS Journal of Solid State Science and Technology, v.9, no.6, pp 1 - 8PublisherElectrochemical Society, Inc.

SCOPUS

Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure Go to Link

Kim, Tae-Gon; Kim, Donggyu; Kim G.; Park, Jingoo

ArticleIssue Date2022CitationECS Transactions, v.108, no.4, pp 131 - 136PublisherInstitute of Physics

Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure

김태곤

ConferenceIssue Date2022PlaceVancouver, Canada

SCIESCOPUS

Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant Go to Link open access

Sahoo, Bichitra Nanda; Han, So Young; Kim, Hyun-Tae; Ando, Keita; Kim, Tae-Gon; Kang, Bong-Kyun; Klipp, Andreas; Yerriboina, Nagendra Prasad; Park, Jin-Goo

ArticleIssue Date2022CitationUltrasonics Sonochemistry, v.82, pp 1 - 14PublisherElsevier BV

SCIESCOPUS

Combined Effects of PVA Brush Scrubbing Parameters and Processes on Post-CMP Cross-Contamination Go to Link

Han, Kwang-Min; Kumar, Sumit; Khan, Mir Jalal; Lee, Jae-Hyeong; Kim, Tae-Gon; Park, Jin-Goo

ArticleIssue Date2025CitationECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.14, no.4, pp 1 - 21PublisherELECTROCHEMICAL SOC INC

SCIESCOPUS

Comparative evaluation of organic contamination sources from roller and pencil type PVA brushes during the Post-CMP cleaning process Go to Link

Lee, Jung-Hwan; Poddar, Maneesh Kumar; Han, Kwang-Min; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo

ArticleIssue Date2020CitationPolymer Testing, v.90, pp 1 - 7PublisherElsevier BV

Contact and non-contact PVA brush conditioning during oxide and metal post-CMP cleaning

김태곤

ConferenceIssue Date2023PlaceKanazawa, Japan

SCIESCOPUS

Contamination Mechanism of Ceria Particles on the Oxide Surface after the CMP Process Go to Link

Han, Kwang-Min; Han, So-Young; Sahir, Samrina; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Mahadev, Niraj; Park, Jin-Goo

ArticleIssue Date2020CitationECS Journal of Solid State Science and Technology, v.9, no.12, pp 1 - 12PublisherElectrochemical Society, Inc.

SCOPUSKCI

Cu ECMP 공정에서 전해액이 연마거동에 미치는 영향 Go to Link

권태영; 김인권; 김태곤; 조병권; 박진구

ArticleIssue Date2008CitationKorean Journal of Materials Research, v.18, no.6, pp 334 - 338Publisher한국재료학회

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