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Browsing by Shong, BonggeunAuthor

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Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces Go to Link

Lee, Jinseon; Oh, Jieun; Kim, Jiwon; Oh, Hongjun; Shong, Bonggeun; Kim, Woo-Hee

ArticleIssue Date2024CitationApplied Surface Science, v.662, pp 1 - 6PublisherElsevier B.V.

SCIESCOPUS

Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors Go to Link

Khan, Rizwan; Shong, Bonggeun; Ko, Byeong Guk; Lee, Jae Kwang; Lee, Hyunsoo; Park, Jeong Young; Oh, Il-Kwon; Raya, Shimeles Shumi; Hong, Hyun Min; Chung, Kwun-Bum, et al.

ArticleIssue Date2018CitationChemistry of Materials, v.30, no.21, pp.7603 - 7610PublisherAmerican Chemical Society

SCIESCOPUS

Atomic Layer Deposition of Pt on Surface Deactivated by Fluorocarbon Implantation: Investigation of Growth Mechanism Go to Link

Kim, Woo Hee; Shin, Kihyun; Shong, Bonggeun; Godet, Ludovic; Bent, Stacey F.

ArticleIssue Date2020CitationChemistry of Materials, v.32, no.22, pp 9696 - 9703PublisherAmerican Chemical Society

SCIESCOPUS

Chemical mechanism of formation of two-dimensional electron gas at the Al2O3/TiO2 interface by atomic layer deposition Go to Link open access

Park, Jeongwoo; Eom, Hyobin; Kim, Seong Hwan; Seok, Tae Jun; Park, Tae Joo; Lee, Sang Woon; Shong, Bonggeun

ArticleIssue Date2021CitationMaterials Today Advances, v.12, pp 1 - 6PublisherElsevier

SCIESCOPUS

Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions Go to Link

Yu, Neung-Kyung; Lee, Jeong-Min; Kim, Woo-Hee; Shong, Bonggeun

ArticleIssue Date2023CitationApplied Surface Science, v.636, pp 1 - 12PublisherElsevier BV

SCIESCOPUS

Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminum Go to Link open access

Eom, Hyobin; Bae, Woojin; Sung, Ju Young; Choi, Ji Hyeon; Dae, Kyun Seong; Jang, Jae Hyuck; Park, Tae Joo; Lee, Sang Woon; Shong, Bonggeun

ArticleIssue Date2024CitationAPL Materials, v.12, no.3, pp 1 - 9PublisherAmerican Institute of Physics

SCIESCOPUS

Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity Go to Link

Lee, Jinseon; Lee, Jeong-Min; Oh, Hongjun; Kim, Changhan; Kim, Jiseong; Kim, Dae Hyun; Shong, Bonggeun; Park, Tae Joo; Kim, Woo-Hee

ArticleIssue Date2021CitationAdvanced Functional Materials, v.31, no.33, pp 1 - 10PublisherJohn Wiley & Sons Ltd.

SCIESCOPUS

Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates Go to Link

Lee, Jeong-Min; Lee, Jinseon; Oh, Hongjun; Kim, Jiseong; Shong, Bonggeun; Park, Tae Joo; Kim, Woo-Hee

ArticleIssue Date2022CitationApplied Surface Science, v.589, pp 1 - 9PublisherElsevier BV

SCIESCOPUS

Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone Go to Link

Lee, Young-Soo; Choi, Dong-won; Shong, Bonggeun; Oh, Saeroonter; Park, Jin-Seong

ArticleIssue Date2017CitationCERAMICS INTERNATIONAL, v.43, no.2, pp.2095 - 2099PublisherELSEVIER SCI LTD

SCIESCOPUS

Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition Go to Link

Oh, Il-Kwon; Kim, Woo-Hee; Zeng, Li; Singh, Joseph; Bae, Dowon; Mackus, Adriaan J. M.; Song, Jeong-Gyu; Seo, Seunggi; Shong, Bonggeun; Kim, Hyungjun, et al.

ArticleIssue Date2020CitationACS NANO, v.14, no.2, pp.1757 - 1769PublisherAMER CHEMICAL SOC

SCISCIESCOPUS

Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 degrees C Using an Aminodisilane Precursor Go to Link

Kim, Dae Hyun; Lee, Han Jin; Jeong, Heonjong; Shong, Bonggeun; Kim, Woo-Hee; Park, Tae Joo

ArticleIssue Date2019CitationChemistry of Materials, v.31, no.15, pp 5502 - 5508PublisherAmerican Chemical Society

SCIESCOPUS

Ultralow-Resistivity Molybdenum-Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-Based Precursor Go to Link

Ha, Min-Ji; Kim, Hyunchang; Choi, Jeong-Hun; Kim, Miso; Kim, Woo-Hee; Park, Tae Joo; Shong, Bonggeun; Ahn, Ji-Hoon

ArticleIssue Date2022CitationChemistry of Materials, v.34, no.6, pp 2576 - 2584PublisherAmerican Chemical Society

SCIESCOPUS

Wafer-Scale Growth of a MoS2 Monolayer via One Cycle of Atomic Layer Deposition: An Adsorbate Control Method Go to Link

Kim, Dae Hyun; Park, Jae Chan; Park, Jeongwoo; Cho, Deok-Yong; Kim, Woo-Hee; Shong, Bonggeun; Ahn, Ji-Hoon; Park, Tae Joo

ArticleIssue Date2021CitationChemistry of Materials, v.33, no.11, pp 4099 - 4105PublisherAmerican Chemical Society

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