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2. Conference Papers(COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF APPLIED PHYSICS > 2. Conference Papers)833

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Collection's Items (Sorted by Issue Date in Descending order): 201 to 220 of 833

Minimum Error Discrimination of N mixed qubit states with arbitrary prior probabilities

권영헌

ConferenceIssue Date2016PlaceMauritius
Synchronization Stability Analysis on Power-Grid Networks

손승우

ConferenceIssue Date2016PlaceDresden, Germany
Effect of diffusivity on the propagation and the Landau damping of the space-charge wave in a turbulent plasma column

정영대

ConferenceIssue Date2016PlaceSan Jose, California, USA
Thermal stress analysis of the extreme ultraviolet multi-stack pellicle with high emissivity coating by finite element method

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
The impact of SRAFs between horizontal and vertical direction in anamorphic hifh NA lithogrpahy

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
The optimization of absorber thickness and absorber material for anamorphic NA system

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
The influence of damaged multi-stack pellicle during exposure process in terms of critical dimension error

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
Feasibility of sub-resolution assist feature in terms of image quality improvement

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
Critical Dimension Degradation Caused by Higher Particle Defect Density on Extreme-Ultraviolet Pellicle

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
Multilayer defect dependency on incident angle distribution in extreme ultraviolet lithography with anamorphic optical system

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
Thermal stress of the multi-stack EUV pellicle during the exposure

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
Accumulated thermal behavior analysis of various LTEM during EUVL scanning process

오혜근

ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
Improvement of voltage linearity of capacitors through stacked structure and annealing process

강보수

ConferenceIssue Date2016Place광주 김대중컨벤션 센터
Influence of post annealing on the response/recovery time of photodetectors based on polycrystalline MoS2

강보수

ConferenceIssue Date2016Place광주 김대중컨벤션센터
Anormalous behavior of the synchronization stability on power-grid networks

손승우

ConferenceIssue Date2016Place김대중컨벤션센터, 광주
Investigation of optimal discrimination of 2 & 3 qubit states under a depolarization channel

권영헌

ConferenceIssue Date2016Place광주
The impact of locally deformed multi-stack pellicle and its optimization for extreme ultraviolet lithography

오혜근

ConferenceIssue Date2016Citation42nd Micro and Nano EngineeringPublisherDanube University
Thermal analysis of extreme ultraviolet pellicle with metallic coatings with finite element method

오혜근

ConferenceIssue Date2016Citation42nd Micro and Nano EngineeringPublisherDanube University
Impact of transmission non-uniformity of wrinkled EUV pellicle for N5 patterning with various illuminations

오혜근

ConferenceIssue Date2016Citation42nd Micro and Nano EngineeringPublisherDanube University
Impact of the Non-Ideal Extreme Ultra-Violet (EUV) Mask Stack for 1x nm Patterning and the Effect on the Anamorphic High-NA lithography

오혜근

ConferenceIssue Date2016Citation42nd Micro and Nano EngineeringPublisherDanube University
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