Mandal, Soumen; Mendhe, Arpit B.; Rakhade, Hitesh M.; Barse, Neha S.; Roy, Mayna; Rosaiah, P.; Park, Taejoon; Lee, Han-Seung; Mendhe, Avinash C.; Kim, Daewon
ArticleIssue Date2025CitationChemical Engineering Journal Advances, v.21, pp 1 - 25PublisherElsevier B.V.