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Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer depositionGo to Link

Jung, Hyunsoo; Jeon, Heeyoung; Choi, Hagyoung; Ham, Giyul; Shin, Seokyoon; Jeon, Hyeongtag

ArticleIssue Date2014CitationJournal of Applied Physics, v.115, no.7, pp 1 - 8PublisherAmerican Institute of Physics
SCISCIESCOPUS
Effect of scan speed on moisture barrier properties of aluminum oxide using spatial atomic layer depositionGo to Link

Shin, Seokyoon; Choi, Hagyoung; Ham, Giyul; Park, Joohyun; Lee, Juhyun; Choi, Hyeongsu; Lee, Seungjin; Kim, Hyunjung; Jeon, Hyeongtag

ArticleIssue Date2017CitationJournal of Vacuum Science and Technology A, v.35, no.2PublisherAmerican Institute of Physics
SCISCIESCOPUS
Fast spatial atomic layer deposition of Al₂O₃ at low temperature (<100 °c) as a gas permeation barrier for flexible organic light-emitting diode displayGo to Link

Choi, Hagyoung; Shin, Seokyoon; Jeon, Hyeongtag; Choi, Yeongtae; Kim, Junghun; Kim, Sanghun; Chung, Seog Chul; Oh, Kiyoung

ArticleIssue Date2016CitationJournal of Vacuum Science and Technology A, v.34, no.1, pp 1 - 7PublisherAmerican Institute of Physics
SCOPUS
High throughput and scalable spatial atomic layer deposition of Al2O3 as a moisture barrier for flexible OLED displayGo to Link

Choi, Hagyoung; Shin, Seokyooon; Choi, Yonghyuk; Choi, Yeongtae; Kim, Junghun; Kim, Sanghun; Kim, Hyungkyu; Park, Jongsik; Chung, Seog Chul; Jeon, Hyeong tag, et al.

ArticleIssue Date2015CitationDigest of Technical Papers - SID International Symposium, v.46, no.Book 2, pp 1043 - 1046
SCISCIESCOPUS
Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low TemperaturesGo to Link

Choi, Hagyoung; Lee, Sanghun; Jung, Hyunsoo; Shin, Seokyoon; Ham, Giyul; Seo, Hyungtak; Jeon, Hyeongtag

ArticleIssue Date2013CitationJapanese Journal of Applied Physics, v.52, no.3, pp 1 - 7PublisherIOP Publishing Ltd
SCISCIESCOPUSKCI
Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer depositionGo to Link

Lee, Sanghun; Choi, Hagyoung; Shin, Seokyoon; Park, Joohyun; Ham, Giyul; Jung, Hyunsoo; Jeon, Hyeongtag

ArticleIssue Date2014CitationCurrent Applied Physics, v.14, no.4, pp 552 - 557PublisherThe Korean Physical Society
SCISCIESCOPUS
Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer depositionGo to Link

Jung, Hyunsoo; Choi, Hagyoung; Jeon, Heeyoung; Lee, Sanghun; Jeon, Hyeongtag

ArticleIssue Date2013CitationJournal of Applied Physics, v.114, no.17, pp 1 - 8PublisherAmerican Institute of Physics
SCISCIESCOPUS
The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2Go to Link

Park, Taeyong; Choi, Dongjin; Choi, Hagyoung; Jeon, Hyeongtag

ArticleIssue Date2012Citationphysica status solidi (a) - applications and materials science, v.209, no.2, pp 302 - 305PublisherWiley - V C H Verlag GmbbH & Co.
SCISCIESCOPUS
Tuning the Electronic Structure of Tin Sulfides Grown by Atomic Layer DepositionGo to Link

Ham, Giyul; Shin, Seokyoon; Park, Joohyun; Choi, Hagyoung; Kim, Jinseo; Lee, Young-Ahn; Seo, Hyungtak; Jeon, Hyeongtag

ArticleIssue Date2013CitationACS Applied Materials & Interfaces, v.5, no.18, pp 8889 - 8896PublisherAmerican Chemical Society
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