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Results 1-8 of 8 (Search time: 0.393 seconds).

Influence of Oxygen Additions on the Etch Characteristics of TaN Thin Films in CF4/Ar Plasma

Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12890 - 12893PublisherAMER SCIENTIFIC PUBLISHERS
Etching Characteristics of Titanium Nitride in Chlorine-Based Plasma

Wang, Yi-Yu; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12933 - 12935PublisherAMER SCIENTIFIC PUBLISHERS
Effect of CF4 Addition to Cl-2/Ar Plasma on the Etching of ZrO2 Thin Films

Son, Seok; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12886 - 12889PublisherAMER SCIENTIFIC PUBLISHERS
A Special Issue on Nanotechnology in Korea 2015-Part 2

Yeom, Geun-Young; Rhee, Joo Yull; Son, Changsik; Boo, Jin-Hyo; Kim, Chang Il; Lee, Sang Heon

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.11, pp 11131 - 11132PublisherAMER SCIENTIFIC PUBLISHERS
A Special Issue on Nanotechnology in Korea 2015-Part 1

Yeom, Geun-Young; Rhee, Joo Yull; Son, Changsik; Boo, Jin-Hyo; Kim, Chang Il; Lee, Sang Heon

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.10, pp 10173 - 10174PublisherAMER SCIENTIFIC PUBLISHERS
Etching Characteristics of TaNO Thin Film for Top Electrode Materials Using Inductivity Coupled CF4/Ar Plasma

Woo, Jong-Chang; Joo, Young-Hee; Kang, Pil-Seung; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12882 - 12885PublisherAMER SCIENTIFIC PUBLISHERS
Furnace O-2 Annealing Growth of Cu2O Thin Film for Thin-Film Transistors at Low Temperature

Woo, Jong-Chang; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12878 - 12881PublisherAMER SCIENTIFIC PUBLISHERS
Optimization of Resistance Uniformity by the Surface Oxidation of Tantalum Nitride for Thin Film Resistors

Woo, Jong-Chang; Kang, Pil-Seung; Kim, Chang-Il

ArticleIssue Date2016CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12835 - 12838PublisherAMER SCIENTIFIC PUBLISHERS
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