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Browsing by Yeung, MichaelAuthor

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193nm inspection of extreme ultraviolet mask absorber defect Go to Link

Kim, Guk-Jin; Kim, In-Seon; Yeung, Michael; Lim, Chang-Moon; Oh, Hye-Keun

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9048, pp 1 - 7PublisherSPIE

SCIESCOPUS

Aerial image deformation caused by various defects of EUV pellicles Go to Link

Lee, Sung-Gyu; Yeung, Michael; Barouch, Eytan; Kim, Mun-Ja; Kim, Seong-Sue; Oh, Hye-Keun

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9048PublisherSPIE

SCIESCOPUS

Aerial image of mesh supported extreme ultraviolet pellicle Go to Link

Ko, Ki-Ho; Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Kim, Mun-Ja; Kim, Seung-Sue; Oh, Hye-Keun

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9048, pp 1 - 8PublisherSPIE

SCIESCOPUS

Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system Go to Link

Kim, In-Seon; Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Kim, Seong-Wook; Oh, Hye-Keun

ArticleIssue Date2016CitationJournal of Micro/ Nanolithography, MEMS, and MOEMS, v.15, no.3, pp 1 - 6PublisherSPIE - International Society for Optical Engineering

SCISCIESCOPUS

Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node Go to Link

Kim, Guk-Jin; Kim, In-Seon; Lee, Sung-Gyu; Yeung, Michael; Kim, Min-Su; Park, Jin-Goo; Oh, Hye-Keun

ArticleIssue Date2017CitationJapanese Journal of Applied Physics, v.56, no.10, pp 1 - 7PublisherIOP Publishing Ltd

SCIESCOPUS

Effect of defects on extreme ultraviolet pellicle Go to Link

Kim, In-Seon; Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Kim, Mun-Ja; Kim, Seong-Sue; Kim, Ji-Won; Oh, Hye-Keun

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9048, pp 1 - 9PublisherSPIE

SCIESCOPUS

Etched multilayer mask in EUV lithography for 16 nm node and below Go to Link

Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9256, pp 1 - 7PublisherSPIE

SCIESCOPUS

Etched multilayer mask is better than conventional absorber mask Go to Link

Kim, Guk-Jin; Oh, Hye-Keun; Kim, In-Seon; Yeung, Michael; Barouch, Eytan

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9256, pp 1 - 14PublisherSPIE

SCISCIESCOPUS

Imaging performance of mesh supported pellicle for extreme ultraviolet lithography Go to Link

Ko, Ki-Ho; Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

ArticleIssue Date2014CitationJapanese Journal of Applied Physics, v.53, no.6, pp 1 - 7PublisherIOP Publishing Ltd

SCIESCOPUS

Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity Go to Link

Kim, In-Seon; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

ArticleIssue Date2016CitationJournal of Micro/ Nanolithography, MEMS, and MOEMS, v.15, no.2, pp 1 - 9PublisherSPIE - International Society for Optical Engineering

SCISCIESCOPUS

Impact of the non-uniform intensity distribution caused by a meshed pellicle of extreme ultraviolet lithography Go to Link

Ko, Ki-Ho; Park, Jin-Goo; Ahn, Jin-Ho; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

ArticleIssue Date2015CitationMicroelectronic Engineering, v.143, pp 31 - 36PublisherElsevier BV

SCIESCOPUS

Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations Go to Link

Kim, In-Seon; Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

ArticleIssue Date2017CitationMICROELECTRONIC ENGINEERING, v.177, pp.35 - 40PublisherELSEVIER SCIENCE BV

SCIESCOPUS

Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle Go to Link

Kim, Guk-Jin; Kim, In-Seon; Lee, Sung-Gyu; Yeung, Michael; Kim, Min-Su; Park, Jin-Goo; Oh, Hye-Keun

ArticleIssue Date2017CitationJournal of Micro/ Nanolithography, MEMS, and MOEMS, v.16, no.4PublisherSPIE - International Society for Optical Engineering

SCIESCOPUS

Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning Go to Link

Kim, In seon; Kim, Guk jin; Yeung, Michael; Barouch, Eytan; Kim, Min su; Park, Jin-Goo; Oh, Hye keun

ArticleIssue Date2016CitationProceedings of SPIE - The International Society for Optical Engineering, v.9985, pp 1 - 8PublisherSPIE

SCIESCOPUS

Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography Go to Link

Kim, Guk-Jin; Kim, In-Seon; Yeung, Michael; Oh, Hye-Keun

ArticleIssue Date2016CitationJournal of Micro/ Nanolithography, MEMS, and MOEMS, v.15, no.2, pp 1 - 5PublisherSPIE - International Society for Optical Engineering

SCIESCOPUS

Source optimization for the whole arc slit with minimum optical proximity correction applied to contact hole patterns Go to Link

Yu, Da-Kyung; Kim, Min-Woo; Kim, Gug-Yong; Chae, Yu-Jin; Son, Seung-Woo; Yeung, Michael; Oh, Hye-Keun

ArticleIssue Date2024CitationINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2024, v.13215, pp 1 - 13PublisherSPIE-INT SOC OPTICAL ENGINEERING

SCISCIESCOPUS

Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node Go to Link

Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

ArticleIssue Date2015CitationJapanese Journal of Applied Physics, v.54, no.6, pp 1 - 9PublisherIOP Publishing Ltd

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