MAJOR IN APPLIED MATERIAL & COMPONENTS (ERICA 소재·부품융합전공)67
Recent Submissions
- Effect of Colloidal Silica and Molybdenum Ions on PVA Brush Loading during Mo Post-CMP Cleaning
- Investigation and Characterization of Mo Surface during Mo Post-CMP Cleaning Process
- Characterization of Alkaline Cu/Ti Slurry for TSV Chemical Mechanical Planarization
- Investigation of Surface Chemistry of 4H-SiC during RCA Cleaning Processes
- Effect of Organic Amine on Ceria Contamination for Nitride Surface During STI CMP
- A Novel Method to Evaluate the Contact Area of PVA Brushes during Post-CMP Cleaning
- Effect of etchants and oxidizers on the Molybdenum surfaces during post-CMP cleaning process
- Effect of Cleaning Chemicals on Defects of PVA Brush during Post-CMP Cleaning
- A novel approach for PVA brush evaluation by contact area analysis during metal and oxide post-CMP cleaning
- Evaluation and effective removal of organic impurity sources during the synthesis process of roller-type PVA brushes for efficient post-CMP cleaning
- Contact and non-contact PVA brush conditioning during oxide and metal post-CMP cleaning
- Photoelectrochemical Properties of Pulse-Reverse Electrodeposited Sb<sub>2</sub>Se<sub>3</sub>/TiO<sub>2</sub> Nanotube Photoanodes' Controlled Sb<sub>2</sub>Se<sub>3</sub> Overlayer
- Pinpoint particle removal for EUV Pellicle Productivity Enhancement
- Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing
- Acoustic power dependent detachment of PSL particles adhered to glass surfaces by dissolved gas and anionic surfactant in an ultrasonic field
- Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing
- Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application
- Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices
- Selective removal of EUV-exposed particles from pellicle
- Boosting performance of CdTe photocathode with pulse-reverse electrodeposited nickel telluride-nickel phosphide dual co-catalysts