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A High-Performance WSe2/h-BN Photodetector using a Triphenylphosphine (PPh3)-Based n-Doping Technique Go to Link

Jo, Seo-Hyeon; Kang, Dong-Ho; Shim, Jaewoo; Jeon, Jaeho; Jeon, Min Hwan; Yoo, Gwangwe; Kim, Jinok; Lee, Jaehyeong; Yeom, Geun Young; Lee, Sungjoo, et al.

ArticleIssue Date2016CitationAdvanced Materials, v.28, no.24, pp 4824 - 4831PublisherWILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

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Effect of RF Pulsing Biasing on the Etching of Magnetic Tunnel Junction Materials Using CH3OH Go to Link

Jeon, Min Hwan; Yun, Deok Hyun; Yang, Kyung Chae; Youn, Ji Youm; Lee, Du Yeong; Shim, Tae Hun; Park, Jea Gun; Yeom, Geun Young

ArticleIssue Date2014CitationJournal of Nanoscience and Nanotechnology, v.14, no.12, pp 9680 - 9685PublisherAmerican Scientific Publishers

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Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma Go to Link

Jeon, Min Hwan; Youn, Ji Youn; Yang, Kyung Chae; Yun, Deok Hyun; Lee, Du Yeong; Shim, Tae Hun; Park, Jea Gun; Yeom, Geun Young

ArticleIssue Date2014CitationJournal of Nanoscience and Nanotechnology, v.14, no.12, pp 9541 - 9547PublisherAmerican Scientific Publishers

SCIESCOPUS

Etch characteristics of magnetic tunnel junction materials using H₂/NH₃ reactive ion beam Go to Link

Kim, Ju Eun; Kim, Doo San; Gill, You Jung; Jang, Yun Jong; Kim, Ye Eun; Cho, Hanna; Won, Bok-Yeon; Kwon, Oik; Yoon, Kukhan; Choi, Jin-Young, et al.

ArticleIssue Date2021CitationNANOTECHNOLOGY, v.32, no.5, pp.1 - 9PublisherIOP PUBLISHING LTD

SCISCIESCOPUS

Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography Go to Link

Kwon, Gwangmin; Ko, Kyeongkeun; Lee, Haiwon; Lim, Woongsun; Yeom, Geun Young; Lee, Sunwoo; Ahn, Jinho

ArticleIssue Date2011CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.29, no.1, pp 1 - 6PublisherAmerican Institute of Physics

SCISCIESCOPUS

High-Performance 2D Rhenium Disulfide (ReS₂) Transistors and Photodetectors by Oxygen Plasma Treatment Go to Link

Shim, Jaewoo; Oh, Aely; Kang, Dong-Ho; Oh, Seyong; Jang, Sung Kyu; Jeon, Jaeho; Jeon, Min Hwan; Kim, Minwoo; Choi, Changhwan; Lee, Jaehyeong, et al.

ArticleIssue Date2016CitationAdvanced Materials, v.28, no.32, pp 6985 - 6992PublisherWILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

SCISCIESCOPUS

In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential Go to Link

Park, Jin Woo; Chae, Myeong Gyoon; Kim, Doo San; Lee, Won Oh; Song, Han Dock; Choi, Changhwan; Yeom, Geun Young

ArticleIssue Date2018CitationJournal of Physics D: Applied Physics, v.51, no.44PublisherIOP Publishing Ltd.

SCISCIESCOPUS

Influence of pulsed bias frequency on the etching of magnetic tunneling junction materials Go to Link

Yang, Kyung Chae; Park, Sung Woo; Jeon, Min Hwan; Viet Phuong Pham; Lee, Du Yeong; Shim, Tae Hun; Park, Jea Gun; Yeom, Geun Young

ArticleIssue Date2016CitationVacuum, v.127, pp 82 - 87PublisherPergamon Press Ltd.

SCIESCOPUS

Photoresist ashing technology using N-2/O-2 ferrite-core ICP in the dual damascene process Go to Link

Kim, Hyoun Woo; Myung, Ju Hyun; Lee, Jong Woo; Kim, Hyung-Sun; Kim, Keeho; Jang, Jeong-Yeol; Yoon, Tae-Ho; Kim, Sung Kyeong; Choi, Dae-Kyu; Chung, Chin-Wook, et al.

ArticleIssue Date2006CitationJournal of Materials Science, v.41, no.15, pp 5040 - 5042PublisherKluwer Academic Publishers

SCISCIESCOPUS

Roughening of Polyimide Surface for Inkjet Printing by Plasma Etching Using the Polyimide Masked with Polystyrene Nanosphere Array Go to Link

Mun, Mu Kyeom; Park, Jin Woo; Ahn, Jin Ho; Kim, Ki Kang; Yeom, Geun Young

ArticleIssue Date2015CitationJournal of Nanoscience and Nanotechnology, v.15, no.10, pp 8176 - 8182PublisherAmerican Scientific Publishers

SCISCIESCOPUS

Selected Peer-Reviewed Articles from the NANO KOREA 2010 Symposium Go to Link

Jang, Moongyu; Han, Il Ki; Chang, Won-Seok; Suh, Minah; Cheong, Hyeonsik; Yun, Wan Soo; Choi, Kyoung-Jin; Yeom, Geun Young; Lee, Seongjae; Lee, Joo Yull, et al.

ArticleIssue Date2011CitationJournal of Nanoscience and Nanotechnology, v.11, no.7, pp 5599 - 5602PublisherAmerican Scientific Publishers

SCISCIESCOPUS

Thin-Film Transistors: High-Performance 2D Rhenium Disulfide (ReS₂) Transistors and Photodetectors by Oxygen Plasma Treatment (Adv. Mater. 32/2016)Go to Link

Shim, Jaewoo; Oh, School; Kang, Dong-Ho; Oh, Seyong; Jang, Sung Kyu; Jeon, Jaeho; Jeon, Min Hwan; Kim, Minwoo; Choi, Chang hwan; Lee, Jaehyeong, et al.

ArticleIssue Date2016CitationAdvanced Materials, v.28, no.32, pp 6984 - 6984PublisherWILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

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