ScholarWorks@Hanyang University

2. Conference Papers(서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers)4,848

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Collection's Items (Sorted by Submit Date in Descending order): 1461 to 1480 of 4848

유기소스 원자층 증착법으로 증착된 TiN 박막의 특성 연구

전형탁

ConferenceIssue Date2002Place한양대학교(안산) 제1과학기술관 및 백남학술관
PEALD법으로 증착된 ZrO2 Gate Dielectric의 열처리 온도에 따른 특성의 변화

전형탁

ConferenceIssue Date2002Place한양대학교(안산) 제1과학기술관 및 백남학술관
유기소스 원자층 증착법으로 증착된 TiN박막의 특성 연구

김영도

ConferenceIssue Date2002Place한양대학교 안산캠퍼스
자성재료 박막의 증착거동에 대한 분자동역학연구

정용재

ConferenceIssue Date2002Place강원대학교
Properties of HfO2 gate dielectrics prepared by atomic layer depositon using HfCl4/H2O precursors

안진호

ConferenceIssue Date2002Place서울
Characterization of atomic layer deposited HfO2/SiON stack gate dielectrics

안진호

ConferenceIssue Date2002Place서울
Spcetroscopical analysis of SiO2 optical film fabricated by FHD

신동욱

ConferenceIssue Date2002PlaceSeoul, Korea
Fabrication and Optical Characterization of Glass-Ceramics for IR reflector

신동욱

ConferenceIssue Date2002PlaceSeoul, Korea
Voronoi Diagram as an Analysis Tool for Spatial Properties for Ceramics

정용재

ConferenceIssue Date2002Place한양대학교
Ab initio Study on SiC-Based Diluted Magnetic Semiconductors

정용재

ConferenceIssue Date2002Place한양대학교
Molecular Simulation of Deposition Behavior in Co-Al System

정용재

ConferenceIssue Date2002Place한양대학교
Characteristics of ZrO2 Films Deposited by Atomic layer Deposition Method for Gate Dielectric Applications

전형탁

ConferenceIssue Date2002PlaceHanyang University
Characteristics of Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect

전형탁

ConferenceIssue Date2002PlaceHanyang University
Characteristics of HfO2/Al2O3 Nano-laminate Films for Gate Dielectric Applicationsav

전형탁

ConferenceIssue Date2002PlaceHanyang Univ. Seoul. Korea
Comparison of TiN Thin film Deposited by Metal Organic Atomic Layer Deposition using TDMAT and TDEAT

김영도

ConferenceIssue Date2002PlaceFukuoka,Japan
Fabrication and Mechanical Properties of Al2O3/Cu Nanocomposite

김영도

ConferenceIssue Date2002PlaceFukuoka,Japan
Study of the Characteristics of TiN Film Deposited by ALD Method with MO Source and NH₃

김영도

ConferenceIssue Date2002PlaceFukuoka,Japan
Circle Set Voronoi Diagram for the Analysis of Spatial Properties for Ceramic Powder

정용재

ConferenceIssue Date2002Place한양대학교
A study on the simulation and characterization of the barrier layers for EUV reflective multilayers for EUV lithography applications

안진호

ConferenceIssue Date2002PlaceHakone
SOFC 금속제 접합자 개발에 관한 연구

김영도

ConferenceIssue Date2002Place순천대학교
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