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Browsing by Kim, Sang-KonAuthor

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SCIESCOPUS

A Mask Generation Approach to Double Patterning Technology with Inverse Lithography Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2008CitationJapanese Journal of Applied Physics, v.47, no.11, pp 8333 - 8337PublisherIOP Publishing Ltd

SCIESCOPUSKCI

A study of process parameter control for nanopattern Go to Link

Kim, Sang-Kon; OH, HYE KEUN

ArticleIssue Date2004CitationJournal of the Korean Physical Society, v.45, no.S(suppl.), pp S736 - S739Publisher한국물리학회

SCISCIESCOPUS

A study of virtual lithography process for polymer directed self-assembly Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2010CitationMICROELECTRONIC ENGINEERING, v.87, no.5-8, pp 883 - 886PublisherELSEVIER SCIENCE BV

SCISCIESCOPUS

Advanced Lithography Simulation for Various 3-Dimensional Nano/Microstructuring Fabrications in Positive- and Negative-Tone Photoresists Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2011CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.11, no.1, pp 528 - 532PublisherAMER SCIENTIFIC PUBLISHERS

SCIESCOPUSKCI

Bulk effects of thermal flow resists Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; An, Ilsin; Lee, Sung-Muk; Bok, Cheol-Kyu; Moon, Seung-Chan

ArticleIssue Date2005CitationJournal of the Korean Physical Society, v.46, no.6, pp 1439 - 1444Publisher한국물리학회

SCIESCOPUSKCI

Bulk image formation of scalar modeling in a photoresist Go to Link

Kim, Sang-Kon; Oh, Hye-Keun

ArticleIssue Date2002CitationJournal of the Korean Physical Society, v.41, no.4, pp 456 - 460Publisher한국물리학회

SCIESCOPUS

Contact hole reflow by finite element method Go to Link

Kim, Sang-Kon; An,Ilsin; Oh,Hye-Keun.; Lee, Sun Muk; Bok, Cheolkyu; Moon,Seung Chan .

ArticleIssue Date2005CitationProgress in Biomedical Optics and Imaging - Proceedings of SPIE, v.5753, no.II, pp 1194 - 1201

SCOPUS

Embedded micro / nano channels formation for three-dimensional negative-tone photoresist microstructuring Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2009CitationProceedings of SPIE - The International Society for Optical Engineering, v.7273, pp 1 - 6PublisherSPIE

SCIESCOPUSKCI

Impact of Polarization Inside a Resist for ArF Immersion Lithography Go to Link

Kim, Sang-Kon; Oh, Hye-Keum; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2009CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.54, no.4, pp 1685 - 1691PublisherKOREAN PHYSICAL SOC

SCIESCOPUSKCI

Impact of the Parameters for a Chemically-amplified Resist on the Line-edge-roughness by Using a Molecular-scale Lithography Simulation Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2009CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.2, pp 675 - 680PublisherKOREAN PHYSICAL SOC

SCIESCOPUSKCI

Influence of Mask Feature on the Diffracted Light in Proximity and Contact Lithography Go to Link

Kim, Sang-Kon; Oh, Hye-Keun

ArticleIssue Date2008CitationJournal of the Korean Physical Society, v.53, no.6, pp 3578 - 3583Publisher한국물리학회

SCISCIESCOPUSKCI

Mechanism of Embedded Micro/Nano Channel Formation for a Negative-tone Photoresist by Moving Mask Lithography Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2010CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.56, no.3, pp 851 - 855PublisherKOREAN PHYSICAL SOC

SCIESCOPUSKCI

Modeling of the Cross-linking and the Diffusion Processes in a Negative Chemically Amplified Resist Go to Link

Kim, Sang-Kon; Oh, Hye-Keun; Jung, Young-Dae; An, Ilsin

ArticleIssue Date2009CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.2, pp 661 - 665PublisherKOREAN PHYSICAL SOC

SCIESCOPUSKCI

Modification of the development parameter for a chemically amplified resist simulator Go to Link

Seo, Eun-Jung; Bak, Heung-Jin; Kim, Sang-Kon; Sohn, Young-Soo; Oh, Hye-Keun

ArticleIssue Date2002CitationJournal of the Korean Physical Society, v.40, no.4, pp 725 - 728PublisherKorean Physical Society

SCIESCOPUSKCICANDI

Optical lithography simulation for the whole resist process Go to Link

Kim, Sang-Kon; Lee, Ji-Eun; Park, Seung-Wook; Oh, Hye-Keun

ArticleIssue Date2006CitationCurrent Applied Physics, v.6, no.1, pp 48 - 53PublisherThe Korean Physical Society

SCIESCOPUSKCI

Process extension techniques for optical lithography: Thermal treatment, polarization and double patterning Go to Link

Kim, Sang-Kon; Oh, Hye-Keun

ArticleIssue Date2007CitationJournal of the Korean Physical Society, v.51, no.4, pp 1413 - 1418Publisher한국물리학회

SCIESCOPUS

Resist distribution effect of spin coating Go to Link

Kim, Sang-Kon; Yoo, Ji-Yong; Oh, Hye-Keun

ArticleIssue Date2002CitationProceedings of SPIE - The International Society for Optical Engineering, v.4691 , no.II, pp 785 - 789PublisherSPIE

SCIESCOPUS

Resist distribution effect of spin coating Go to Link

Kim, Sang-Kon; Yoo, Ji-Yong; Oh, Hye-Keun

ArticleIssue Date2002CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.20, no.6, pp 2206 - 2209PublisherAmerican Institute of Physics

SCIESCOPUS

Simulation benchmarking for the whole resist process Go to Link

Kim, Sang-Kon; Lee, Ji-Eun; Park, Seung-Wook; Yoo, Ji-Yong; Oh, Hye-Keun

ArticleIssue Date2004CitationProceedings of SPIE - The International Society for Optical Engineering, v.5378, pp 58 - 64PublisherSPIE

SCIESCOPUS

Simulation of thermal resist flow process Go to Link

Kim, Sang-Kon; An, Ilsin; Oh, Hye-Keun; Lee, Sun Muk; Bok, Cheol Kyu; Moon, Seung Chan

ArticleIssue Date2005CitationProgress in Biomedical Optics and Imaging - Proceedings of SPIE, v.5753, no.II, pp 1186 - 1193PublisherSPIE

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Browsing by Kim, Sang-KonAuthor

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