ScholarWorks@Hanyang University ERICA Campus: Journal : Proceedings of SPIE - The International Society for Optical Engineering

Proceedings of SPIE - The International Society for Optical Engineering

Journal Title

Proceedings of SPIE - The International Society for Optical Engineering

ISSN

0277-786X

Publisher

Listed on(Coverage)

SJR	1999-2017;2019
CiteScore	2011-2019
SCOPUS	2017-2020

Active

Active
based on the information
- CITESCORE;

Article List

1 - 20 out of 30 results.

SCOPUS

Through pitch line width difference minimization by pixel source optimization

Kim, M.-W.; Yu, D.-K.; Chae, Y.-J.; Ko, H.-C.; Kang, J.-W.; Michael-Yeung,; Son, S.-W.; Oh, H.-K.

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13216, pp 1 - 6PublisherSPIE

SCIESCOPUS

Underlayer dependent local wafer deformation during EUV exposure Go to Link

Ko, Hee-Chang; Kang, Ji-Won; Jeon, Ji-Hyun; Son, Seung-Woo; Oh, Hye-Keun

ArticleIssue Date2024CitationINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2024, v.13215, pp 1 - 8PublisherSPIE-INT SOC OPTICAL ENGINEERING

SCIESCOPUS

Relative lifetime estimation of EUV pellicle by normalized thermal stress Go to Link

Jeon, Ji-Hyun; Son, Seung-Woo; Oh, Hye-Keun

ArticleIssue Date2024CitationINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2024, v.13215, pp 1 - 8PublisherSPIE-INT SOC OPTICAL ENGINEERING

SCIESCOPUS

Source optimization for the whole arc slit with minimum optical proximity correction applied to contact hole patterns Go to Link

Yu, Da-Kyung; Kim, Min-Woo; Kim, Gug-Yong; Chae, Yu-Jin; Son, Seung-Woo; Yeung, Michael; Oh, Hye-Keun

ArticleIssue Date2024CitationINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2024, v.13215, pp 1 - 13PublisherSPIE-INT SOC OPTICAL ENGINEERING

SCIESCOPUS

Source optimization for the whole arc slit with minimum optical proximity correction applied to contact hole patterns

Yu, D.-K.; Kim, M.-W.; Kim, G.-Y.; Chae, Y.-J.; Son, S.-W.; Yeung, M.; Oh, H.-K.

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13215, pp 1 - 13PublisherSPIE

SCIESCOPUS

Underlayer dependent local wafer deformation during EUV exposure Go to Link

Ko, H.-C.; Kang, J.-W.; Jeon, J.-H.; Son, S.-W.; Oh, H.-K.

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13215PublisherSPIE

SCOPUS

Extreme-ultraviolet pellicle durability comparison for better lifetime Go to Link

Shin, H.-G.; Oh, H.-K.

ArticleIssue Date2019CitationProceedings of SPIE - The International Society for Optical Engineering, v.11147PublisherSPIE

SCOPUS

Pattern degradation with larger particles on EUV pellicle Go to Link

No, H.-R.; Lee, S.-G.; Oh, S.-H.; Oh, H.-K.

ArticleIssue Date2018CitationProceedings of SPIE - The International Society for Optical Engineering, v.10809PublisherSPIE

SCOPUS

A possible wafer heating during EUV exposure Go to Link

Oh, S.-H.; Lee, S.-G.; Park, J.-H.; Ban, C.-H.; Oh, H.-K.

ArticleIssue Date2018CitationProceedings of SPIE - The International Society for Optical Engineering, v.10809PublisherSPIE

SCOPUS

Thermomechanical changes of EUV mask and absorber dependency Go to Link

Ban, C.-H.; Lee, S.-G.; Park, E.-S.; Park, J.-H.; Oh, H.-K.

ArticleIssue Date2018CitationProceedings of SPIE - The International Society for Optical Engineering, v.10583PublisherSPIE

SCOPUS

Wrinkle formation analysis in extreme-ultraviolet pellicle Go to Link

Jeong, H.-N.; Kim, G.-J.; Lee, S.-G.; Oh, H.-K.